Nanoscale Patterning and Electronics on Flexible Substrate by Direct Nanoimprinting of Metallic Nanoparticles
Source abstract
Abstract
Nanoscale patterning and electronics fabrication on flexible polymer substrates via direct nanoimprinting of metal nanoparticles was demonstrated. The metal nanoparticle solution enables a simple one-step metal nanoimprinting with very low pressure and temperature. Electrical and structural characterizations on flexible substrate during cyclic bending deformations verify the robustness of the nanoimprinted structures to mechanical deformation conditions.
Source: openalex_inverted_index · Quality: baseline
Research context
OpenAlex topics: Nanofabrication and Lithography Techniques · Nanomaterials and Printing Technologies · Advanced Sensor and Energy Harvesting Materials
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
References (34)
Show source-provided references
1. 10.1149/1.272063510.1149/1.2720635 ↗
2. 10.1063/1.211941610.1063/1.2119416 ↗
3. 10.1088/0957-4484/18/34/34520210.1088/0957-4484/18/34/345202 ↗
4. 10.1063/1.276397310.1063/1.2763973 ↗
5. 10.1038/nature0542710.1038/nature05427 ↗
6. 10.1088/0960-1317/16/10/01010.1088/0960-1317/16/10/010 ↗
7. 10.1016/S0924-4247(99)00277-010.1016/S0924-4247(99)00277-0 ↗
8. 10.1016/j.sna.2004.07.00910.1016/j.sna.2004.07.009 ↗
9. 10.1088/0964-1726/10/6/31210.1088/0964-1726/10/6/312 ↗
10. 10.1073/pnas.09158809810.1073/pnas.091588098 ↗
11. 10.1002/adma.20030501210.1002/adma.200305012 ↗
12. 10.1021/la981161810.1021/la9811618 ↗
13. 10.1002/adma.20030484610.1002/adma.200304846 ↗
14. 10.1088/0960-1317/16/8/02310.1088/0960-1317/16/8/023 ↗
15. 10.1016/j.msec.2005.09.00110.1016/j.msec.2005.09.001 ↗
16. 10.1109/TEPM.2005.85653510.1109/TEPM.2005.856535 ↗
17. 10.1109/JSEN.2006.88416810.1109/JSEN.2006.884168 ↗
18. 10.1016/j.sna.2006.04.03610.1016/j.sna.2006.04.036 ↗
19. 10.1126/science.290.5499.212310.1126/science.290.5499.2123 ↗
20. 10.1063/1.271916210.1063/1.2719162 ↗
21. 10.1063/1.270991410.1063/1.2709914 ↗
22. 10.1143/JJAP.45.L54610.1143/JJAP.45.L546 ↗
23. 10.1088/0957-4484/13/5/30710.1088/0957-4484/13/5/307 ↗
24. 10.1007/s00339-004-3176-y10.1007/s00339-004-3176-y ↗
25. 10.1063/1.148198010.1063/1.1481980 ↗
26. 10.1116/1.59041710.1116/1.590417 ↗
27. C. M. Sotomayor Torres Alternative Lithography Springer New York2003.10.1007/978-1-4419-9204-8 ↗
28. 10.1016/j.mee.2005.09.00610.1016/j.mee.2005.09.006 ↗
29. 10.1016/j.mee.2006.09.00210.1016/j.mee.2006.09.002 ↗
30. Yoshihiko H. · Proc. SPIE‐Int. Soc. Opt. Eng. · 2003 · 5220 · 74
31. 10.1016/j.mee.2006.01.09510.1016/j.mee.2006.01.095 ↗
32. 10.1021/nl070333v10.1021/nl070333v ↗
33. R. F. Pierret Semiconductor Device Fundamentals Addison Wesley New York1996.
34. 10.1021/la970588w10.1021/la970588w ↗