Nanocrystalline CdSe: Structural and photoelectrochemical characterization
Source abstract
Abstract
Nanocrystalline cadmium selenide thin films have been deposited on non-conducting glass substrates using oxalic acid. The film thickness was found to be 0.73 µm with a growing time of 6 h. The structural, morphological, optical, electrical properties of samples were studies. Photoelectrochemical performance was also studied. Room temperature deposition results in films with the cubic structure and crystallite size of about 19.33 nm. The optical band gap energy of the film sample was found to be 1.91 eV. The efficiency of photoelectrode was found to be 1.1% using sulphide-polysulphide electrolyte.
Source: openaire · Quality: candidate unverified · Source record ↗
Research context
OpenAlex topics: Quantum Dots Synthesis And Properties · Chalcogenide Semiconductor Thin Films · Semiconductor materials and interfaces
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
References (50)
Show source-provided references
1. C. Shahane, D. Sutrave, and L. Deshmukh, Ind. J. Pure Appl. Phys. 34, 153 (1996).
2. M. Roth, Nucl. Instrum Methods-A, 283, 291 (1989).10.1016/0168-9002(89)91374-0 ↗
3. W. Spachmann, E. Luder, T. Kalfab, and W. Otterbach, Polycrystalline Semiconductors, Grain Boundries and Interfaces, p. 262, Springer (1989).
4. H. Ponce, J. Borja, A. Rojas, M. Sanchez, Y. Vorobiev, R. Bon, J. Robles, and J. Hernandez, Mater. Chem. Phys. 113, 824 (2009).10.1016/j.matchemphys.2008.08.060 ↗
5. S. Min, O. Joo, R. Mane, K. Jung, C. Lokhande, and S. Han, J. Photochem. Photobiology A: Chemistry 187, 133 (2007).10.1016/j.jphotochem.2006.09.016 ↗
6. K. Sharma, R. Sharma, and J. Garg, Jpn. J. Appl. Phys. 31, 742 (1992).10.1143/JJAP.31.742 ↗
7. M. Perez, J. Hernandez, G. Puente, J. Gercia, and E. Salinas, Physica E 40, 2535 (2008).10.1016/j.physe.2007.10.102 ↗
8. A. Yadav, M. Barote, and E. Masumdar, Chalcogenide Lett. 6, 149 (2009).
9. P. Sharma, D. Leonello, S. Chandra, and K. Misra, Proceeding of the Tenth International Workshop on the Physics of Semiconductor Devices, Vol II, 1175 (1999).
10. J. Hu, T. Odom, and C. Mlieber, Acc. Chem. Res. 32, 435 (1999).10.1021/ar9700365 ↗
11. C. Rao, A. Govinaraj, D. Leonard, and N. Gunari, Appl. Phys. Lett. 78, 1853 (2001).10.1063/1.1359145 ↗
12. L. Manna, W. Wang, J. Wickham, E. Scher, A. Kadavanich, and A. Alivisatos, Nature 404, 59 (2000).10.1038/35003535 ↗
13. Z. Ding, B. Quinn, S. Haram, L. Pell, B. Korgel, and A. Bard, Science 296, 1293 (2002).10.1126/science.1069336 ↗
14. S. Coe, W. Woo, M. Bawendi, and V. Bulvoc, Nature 420, 800 (2002).10.1038/nature01217 ↗
15. H. Wang, J. Zhu, and H. Chen, Phys. Chem. B 106, 3848 (2002).10.1021/jp0135003 ↗
16. A. Raevskaya, A. Stroyuk, S. Kuchmiy, Y. Azhniuk, V. Dzhagan, V. Yukhymchuk, and M. Valakh, Colloids Surfaces A 290, 304 (2006).10.1016/j.colsurfa.2006.05.038 ↗
17. K. Jortner and C. Rao, Pure Appl. Chem. 74, 1491 (2002).10.1351/pac200274091491 ↗
18. L. Xu, L. Wang, X. Huang, J. Zhu, H. Chen, and K. Chen, Physica E 8, 129 (2000).10.1016/S1386-9477(00)00129-6 ↗
19. A. Raevskaya, A. Stroyuk, and S. Kuchmiy, Theor. Exp. Chem. 41, 181 (2005).10.1007/s11237-005-0037-5 ↗
20. M. A. Hines and P. Sionnest, J. Phys. Chem. 100, 468 (1996).10.1021/jp9530562 ↗
21. K. Rajeshwar, N. Tacconi, and C. Chenthamarakshan, Chem. Mater. 13, 2765 (2001).10.1021/cm010254z ↗
22. S. Kim, B. Fisher, H. Eisler, and M. Bawendi, J. Am. Chem. Soc. 125, 11466 (2003).10.1021/ja0361749 ↗
23. E. Masumdar and L. Deshmukh, Turk J. Phys. 27, 271 (2003).
24. S. Erat, H. Metin, and M. Ari, Mater. Chem. Phys. 111, 114 (2008).10.1016/j.matchemphys.2008.03.021 ↗
25. E. Masumdar, V. Gaikwad, V. Pujari, P. More, and L. Deshmukh, Mater. Chem. Phys. 77, 669 (2002).10.1016/S0254-0584(02)00122-0 ↗
26. G. Hodes, A. Yaron, F. Mostisuke, and D. Mostisuke, Phys. Rev. B 36, 4215 (1987).10.1103/PhysRevB.36.4215 ↗
27. H. Pathan, B. Sankapal, J. Desai, and C. Lokhande, Mater. Chem. Phys. 78, 11 (2002).10.1016/S0254-0584(02)00198-0 ↗
28. P. Hankare, S. Delekar, M. Asabe, P. Chate, V. Bhuse, A. Khomane, K. Garadkar, and B. Sarwade, J. Phys. Chem. Solids 67, 2506 (2006).10.1016/j.jpcs.2006.07.006 ↗
29. A. Khomane, J. Alloys Compd. 506, 849 (2010).10.1016/j.jallcom.2010.07.092 ↗
30. A. Khomane and P. Hankare, J. Alloys Compd. 489, 605 (2010).10.1016/j.jallcom.2009.09.122 ↗
31. P. Nemec, M. Simurda, I. Nemec, D. Sprinzl, P. Formanek, and P. Maly, J. Crys. Growth 292, 78 (2006).10.1016/j.jcrysgro.2006.03.057 ↗
32. M. Simurda, P. Nemec, P. Formanek, I. Nemec, Y. Nemcova, and P. Maly, Thin Solid Films 511, 71 (2006).10.1016/j.tsf.2005.11.093 ↗
33. T. Shyju, S. Anandhi, R. Indirajith, and R. Gopalkrishan, J. Alloy Compd. 506, 892 (2010).10.1016/j.jallcom.2010.07.106 ↗
34. A. Kokate, U. Suryavanshi, and C. Bhosale, Solar Ener. 80, 156 (2006).10.1016/j.solener.2005.04.013 ↗
35. V. Bhuse, Mater. Chem. Phys. 91, 60 (2005).10.1016/j.matchemphys.2004.10.047 ↗
36. R. Kale and C. Lokhande, Appl. Surf. Sci. 223, 343 (2004).10.1016/j.apsusc.2003.09.022 ↗
37. S. Kale and C. Lokhande, Mater. Chem. Phys. 62, 103 (2000).10.1016/S0254-0584(99)00139-X ↗
38. S. Dhumure and C. Lokhande, Sol. Ener. Mater. Sol. Cells 29, 183 (1993).10.1016/0927-0248(93)90076-F ↗
39. C. Lokhande, E. Lee, K. Jung, and O. Joo, Mater. Chem. Phys. 91, 200 (2005).10.1016/j.matchemphys.2004.11.014 ↗
40. P. Hankare, A. Manikshete, D. Sathe, and P. Chate, Mater. Sci: Mater. Electron. 21, 698 (2010).10.1007/s10854-009-9980-6 ↗
41. P. Chate, D. Sathe, and P. Hankare, J. Mater. Sci: Mater. Electron. 22, 111 (2011).10.1007/s10854-010-0096-9 ↗
42. R. Kale, S. Sartale, B. Chougule, and C. Lokhande, Semicond. Sci. Technol. 19, 980 (2004).10.1088/0268-1242/19/8/006 ↗
43. P. Hankare, P. Chate, and D. Sathe, Solid State Sciences 11, 1226 (2009).10.1016/j.solidstatesciences.2009.03.016 ↗
44. J. Bardeen, F. Blutt, L. Hall, in: R. Russel, E. Hahn (Eds.) Proceedings of the Photoconductivity Conference, p. 28, Wiley, NY (1975).
45. D. Bhattacharya, S. Choudhary, and A. Pal, Vacuum, 43, 313 (1992).10.1016/0042-207X(92)90163-Q ↗
46. A. West, Solid State and Its Applications, p. 317, Wiley (1989).
47. K. Chopra, Thin Film Phenomenon, p. 41, McGraw-Hill, New York (1969).
48. G. Harbeke (Eds), Polycrystalline Semiconductors: Physical Properties and Applications, p. 170, Berlin Springer (1985).
49. G. Rusu, M. Popa, and I. Salaoru, Appl. Surf. Sci. 218, 222 (2003).10.1016/S0169-4332(03)00618-4 ↗
50. P. Hankare, P. Chate, D. Sathe, and B. Jadhav, J. Alloy Compd. 503, 220 (2010).10.1016/j.jallcom.2010.04.237 ↗