Ultrafast UV switch based on ZnO-Ag heterostructures
Source abstract
Abstract
ZnO-silver (Ag) heterostructure nanoparticle films were prepared by spin-coating, followed by annealing at 700°C for 2 h. The films were then used as UV photodetector which show high photoresponse. The heterostructure-film device displayed an ultrafast decay time of 18 ms and a rise time of 50 ms upon ultraviolet irradiation. Additionally, the time-dependent photocurrent upon UV switching reveals a rectangularly shaped profile, rarely reported in previous literature. The highly improved photoresponse properties of ZnO-Ag heterostructure-film device could be attributed to the Schottky barrier height (SBH) and depletion width reduction from the embedded Ag nanoclusters. Compared to a pure ZnO film, both the responsivity (Rλ) and external quantum efficiency (EQE) of the ZnO-Ag heterostructure-film photodetectors were improved more than 13-fold. This research provides a promising strategy for fabricating UV-photodetectors with ultrafast response.
Source: openaire · Quality: candidate unverified · Source record ↗
Research context
OpenAlex topics: ZnO doping and properties · Copper-based nanomaterials and applications · Quantum Dots Synthesis And Properties
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
References (24)
Show source-provided references
1. Y. Q. Bie, Z. M. Liao, H. Z. Zhang, G. R. Li, Y. Ye, Y. B. Zhou, J. Xu, Z. X. Qin, L. Dai, and D. P. Yu, Adv. Mater. 23, 649 (2011).10.1002/adma.201003156 ↗
2. S. Bai, W. Wu, Y. Qin, N. Cui, D. J. Bayerl, and X. Wang, Adv. Funct. Mater. 21, 4464 (2011).10.1002/adfm.201101319 ↗
3. Z. Wang, S. Ran, B. Liu, D. Chen, and G. Shen, Nanoscale 4, 3350 (2012).10.1039/c2nr30440f ↗
4. Z. Zhan, L. Zheng, Y. Pan, G. Sun, and L. Li, J. Mater. Chem. 22, 2589 (2012).10.1039/C1JM13920G ↗
5. Z. Zhan, C. Liu, L. Zheng, G. Sun, B. Li, and Q. Zhang, Phys. Chem. Chem. Phys. 13, 20471 (2011).10.1039/c1cp22340b ↗
6. R. Simas, M. Kimmo, J. Terhi, M. Marco, K. Olga, J. Hua, T. Oleg, L. Harri, I. K. Esko, and G. N. Albert, Nanotechnology 23, 095502 (2012).10.1088/0957-4484/23/9/095502 ↗
7. L. Yanbo, P. Alexander, Y. Ichiro, K. Yasuo, and D. Jean-Jacques, Nanotechnology 21, 295502 (2010).10.1088/0957-4484/21/29/295502 ↗
8. M. Liu and H. K. Kim, Appl. Phys. Lett. 84, 173 (2004).10.1063/1.1640468 ↗
9. R. R. Prabhakar, N. Mathews, K. B. Jinesh, K. R. G. Karthik, S. S. Pramana, B. Varghese, C. H. Sow, and S. Mhaisalkar, J. Mater. Chem. 22, 9678 (2012).10.1039/c2jm16698d ↗
10. D. Li, X. Sun, H. Song, Z. Li, Y. Chen, H. Jiang, and G. Miao, Adv. Mater. 24, 845 (2012).10.1002/adma.201102585 ↗
11. Y. Z. Li, X. M. Li, and X. D. Gao, J. Alloys Compd. 509, 7193 (2011).10.1016/j.jallcom.2011.04.039 ↗
12. J. Q. Yuan, E. Shi, G. Choo, T. Xiaosheng, Y. Sheng, and J. M. Xue, Nanotechnology 21, 185606 (2010).10.1088/0957-4484/21/18/185606 ↗
13. R. V. Muniswami Naidu, A. Subrahmanyam, A. Verger, M. K. Jain, S. V. N. Bhaskara Rao, S. N. Jha, and D. M. Phase, Electron. Mater. Lett. 8, 457 (2012).10.1007/s13391-012-1086-2 ↗
14. Y. Lim, S. Seo, B. Kim, H. S. Choi, W. S. Seo, Y. Cho, and H. H. Park, Electron. Mater. Lett. 8, 375 (2012).10.1007/s13391-012-2006-1 ↗
15. X. Li, C. Gao, H. Duan. B. Lu, X. Pan, and E. Xie, Nano Energy 1, 640 (2012).10.1016/j.nanoen.2012.05.003 ↗
16. X. An, Z. Zhang, J. Song, Y. Liu, X. Li, Y. He, C. Gong, and E. Xie, Mater. Lett. 65, 3552 (2011).10.1016/j.matlet.2011.07.058 ↗
17. R. Georgekutty, M. K. Seery, and S. C. Pillai, J. Phys. Chem. C 112, 13563 (2008).10.1021/jp802729a ↗
18. D. Lin, H. Wu, R. Zhang, and W. Pan, Chem. Mater. 21, 3479 (2009).10.1021/cm900225p ↗
19. Y. Zheng, L. Zheng, Y. Zhan, X. Lin, Q. Zheng, and K. Wei, Inorg. Chem. 46, 6980 (2007).10.1021/ic700688f ↗
20. Y. Zheng, C. Chen, Y. Zhan, X. Lin, Q. Zheng, K. Wei, and J. Zhu, J. Phys. Chem. C 112, 10773 (2008).10.1021/jp8027275 ↗
21. K. ul Hasan, N. H. Alvi, J. Lu, O. Nur, and M. Willander, Nanoscale Res. Lett. 6, 348 (2011).10.1186/1556-276X-6-348 ↗
22. L. Hu, J. Yan, M. Liao, H. Xiang, X. Gong, L. Zhang, and X. Fang, Adv. Matter. 24, 2305 (2012).10.1002/adma.201200512 ↗
23. J. Kim, J. H. Yun, C. H. Kim, Y. C. Park, J. Y. Woo, J. Park, J. H. Lee, J. Yi, and C. S. Han, Nanotechnology 21, 115205 (2010).10.1088/0957-4484/21/11/115205 ↗
24. P. N. Prasad, Nanophotonics, p. 399, Opt. Express, New York (2004).10.1002/0471670251.index ↗