journal article·2016Open access

Structural and Electrical Investigation of MoS2Thin Films Formed by Thermal Assisted Conversion of Mo Metal

Ray Duffy, Patrick Foley, Bruno Filippone, Gioele Mirabelli, Dan O'Connell, Brendan Sheehan, Pat Carolan, Michael Schmidt, Karim Cherkaoui, Riley Gatensby, Toby Hallam, Georg Duesberg, Felice Crupi, Roger Nagle, Paul K. Hurley

Abstract

Large-area synthesis is of great demand for the preparation of high-performance transitionmetal-dichalcogenides (TMD) devices, however there are only limited reports to date of device operation on large-area TMDs. In this work we fabricate MoS 2 devices based on Thermal Assisted Conversion (TAC) of metal layers, and characterise the thin-films with material analysis combined with electrical device parameter extraction. Specifically we report on temperature dependent parameter extraction for Ti/Au contacts to MoS 2 thin-films to determine sheet resistance (R sh ), resistivity (), and the activation energy (E A ) of on-state current flow. For undoped MoS 2 , was determined to be 191 .cm at 25 C. The activation energy of the on-state current was found to be 0.18 eV, pointing to the presence of deep levels in MoS 2 .
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Research context

OpenAlex topics: 2D Materials and Applications · MXene and MAX Phase Materials · Ferroelectric and Negative Capacitance Devices

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