Processing Technologies for Advanced Ge Devices

R. Loo; A. Y. Hikavyy; L. Witters; A. Schulze; H. Arimura; D. Cott; J. Mitard; C. Porret; H. Mertens; P. Ryan; J. Wall; K. Matney; M. Wormington; P. Favia; O. Richard; H. Bender; A. Thean; N. Horiguchi; D. Mocuta; N. Collaert

doi:10.1149/2.0301612jss

journal article·2017Open access

Processing Technologies for Advanced Ge Devices

R. Loo, A. Y. Hikavyy, L. Witters, A. Schulze, H. Arimura, D. Cott, J. Mitard, C. Porret, H. Mertens, P. Ryan, J. Wall, K. Matney, M. Wormington, P. Favia, O. Richard, H. Bender, A. Thean, N. Horiguchi, D. Mocuta, N. Collaert

ECS Journal of Solid State Science and Technology· Volume 6· Issue 1

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10.1149/2.0301612jss

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OpenAlex topics: Semiconductor materials and devices · Advancements in Semiconductor Devices and Circuit Design · Nanowire Synthesis and Applications

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