Si Wafer Dopant Concentration Effect on Light Emission of Solid State Incandescent Light Emitting Devices
Source abstract
Abstract
Electrical and light emitting characteristics of solid state incandescent light emission devices made on p-type silicon wafers of various dopant concentrations have been studied. The number of conductive paths, i.e., nano-resistors, formed from the dielectric breakdown increased with the increase of the dopant concentration in the wafer, which is accompanied with the increase of the intensity of the emitted light. The breakdown voltage decreased with the increase of the dopant concentration. There exists a transition dopant concentration where the light intensity and the leakage current increase drastically with the increase of the dopant concentration. In summary, the dopant concentration in the silicon wafer is critical to the light emitting phenomenon of the solid state incandescent light emitting device.
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Research context
OpenAlex topics: Nanowire Synthesis and Applications · Semiconductor materials and devices · Thin-Film Transistor Technologies
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
References (23)
Show source-provided references
1. Kuo · Appl. Phys. Lett. · 2013 · 10210.1063/1.4789531 ↗
2. Kuo · Electrochem. Solid-State Lett. · 2013 · 2 · Q5910.1149/2.002308ssl ↗
3. Kuo · Solid-State Electron. · 2013 · 89 · 12010.1016/j.sse.2013.07.013 ↗
4. Kuo · 2016
5. Kuo · IEEE Elec. Dev. Soc. News Lett. · 2015 · 22
6. Liu · Mat. Sci. Semicon. Proc. · 2019 · 93 · 22610.1016/j.mssp.2019.01.010 ↗
7. Lin · Appl. Phys. Lett. · 2015 · 10610.1063/1.4915615 ↗
8. Liu · Nanotechnology · 2017 · 2810.1088/1361-6528/aa7a7d ↗
9. Liu · Semicond. Sci. Technol. · 2017 · 3210.1088/1361-6641/aa65b1 ↗
10. Lin · J. Vac. Sci. Technol. B · 2014 · 3210.1116/1.4843135 ↗
11. Lin · ECS Trans. · 2015 · 64 · 110.1149/06444.0001ecst ↗
12. Kuo · ECS J. Solid State Sc. Technol. · 2019 · 8 · Q22310.1149/2.0071912jss ↗
13. Kuo · ECS Trans. · 2011 · 35 · 1310.1149/1.3569897 ↗
14. Yang · ECS Trans. · 2009 · 25 · 45710.1149/1.3206645 ↗
15. Liu · ECS Lett. · 2009 · 12 · H1110.1149/1.3007423 ↗
16. DiMaria · J. Appl. Phys. · 1995 · 78 · 388310.1063/1.359905 ↗
17. Tsui · J. Appl. Phys. · 2003 · 93 · 1011910.1063/1.1574594 ↗
18. Zhang · J. Phys. D: Appl. Phys. · 2018 · 5110.1088/1361-6463/aaa9d3 ↗
19. Tung · IEEE Electron Device Lett. · 2002 · 23 · 52610.1109/LED.2002.802662 ↗
20. Yang · Nat. Commun. · 2012 · 3 · 73210.1038/ncomms1737 ↗
21. Zhang · ECS Trans. · 2017 · 77 · 7910.1149/07702.0079ecst ↗
22. Smith · Trans. Opt. Soc. · 1931 · 33 · 7310.1088/1475-4878/33/3/301 ↗
23. Borbély · Color Res. Applicat. · 2001 · 26 · 45010.1002/col.1065 ↗