NICKEL THIN FILMS GROWN BY PULSED LASER DEPOSITION: INFLUENCE OF SUBSTRATE AND SUBSTRATE TEMPERATURE
Source abstract
Abstract
Nickel thin films were grown on glass and copper substrate in ultrahigh vacuum at energy density 2×1010 watt/cm2 using Nd:YAG laser. XRD analysis showed the amorphous growth of thin film at low substrate temperature (Ts) while higher Ts supported crystalline growth. Magnetic moment, magnetic residual ratio and coercivity of thin films decreased with increase in Ts for both substrates. However, this decrease was sharp for films deposited on glass substrate as compared to that deposited on copper in Ts range 100oC-500oC. Electrical resistivity of thin film grown on glass substrate decreased while Hall carrier mobility increased with increase in Ts
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Research context
OpenAlex topics: Electrodeposition and Electroless Coatings · Surface Roughness and Optical Measurements · ZnO doping and properties
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