journal article·2020-12Open access

NICKEL THIN FILMS GROWN BY PULSED LASER DEPOSITION: INFLUENCE OF SUBSTRATE AND SUBSTRATE TEMPERATURE

Department of Physics, University of Sargodha, Sargodha 40100, Pakistan, M. NAWAZ. RIZWAN, M. A. KALYAR, Department of Physics, University of Sargodha, Sargodha 40100, Pakistan, C. BELL, School of Physics, University of Bristol, Tyndall Avenue, BS8 1TL, UK, M. ANWAR-UL-HAQ, Department of Physics, University of Sargodha, Sargodha 40100, Pakistan, A. R. MAKHDOOM, Department of Natural Sciences and Humanities, Rachna College of Engineering and Technology, University of Engineering and Technology, Lahore 54890, Pakistan

Abstract

Nickel thin films were grown on glass and copper substrate in ultrahigh vacuum at energy density 2×1010 watt/cm2 using Nd:YAG laser. XRD analysis showed the amorphous growth of thin film at low substrate temperature (Ts) while higher Ts supported crystalline growth. Magnetic moment, magnetic residual ratio and coercivity of thin films decreased with increase in Ts for both substrates. However, this decrease was sharp for films deposited on glass substrate as compared to that deposited on copper in Ts range 100oC-500oC. Electrical resistivity of thin film grown on glass substrate decreased while Hall carrier mobility increased with increase in Ts
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Research context

OpenAlex topics: Electrodeposition and Electroless Coatings · Surface Roughness and Optical Measurements · ZnO doping and properties

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