Modulating the hardness and magnetic property of NiMnWP by an organosulphur additive for magnetic storage applications

In this present investigation, we subjected a user friendly electrodeposition method to develop an NiMnWP thin film for magnetic storage devices .The key point of the research work is to enrich the mechanical and magnetic property by varying the deposition time, bath temperature and adding an organic additive. The NiMnWP magnetic thin film without and with thiourea of 2gm/l is developed and their characteristics were studied. The XRD peak confirms the presence of NiWP with an End centered monoclinic structure with the plane (820),(622) and manganese with (422) cubic plane. The crystallite size varies from 18.58 to 16.84 nm without thiourea and 19.83 to 12.33nm with thiourea. The hardness is found to be enhanced due to the addition of thiourea from 102 to 128, where as the other from 91.4 to 101.8.There is an considerable amount of enhancement in magnetization from 4.53 to 22.304x10-3 emu and retentivity from 1.2500 to 6.34x10-3 emu due to the addition of thiourea. From our experimental work analysis a better magnetic thin films were obtained, to be used in MEMS and magnetic storage devices.