DataVXAdvanced Functional MaterialsPaper
journal article·2012-10-10

3D Patterning: 3D Free‐Form Patterning of Silicon by Ion Implantation, Silicon Deposition, and Selective Silicon Etching (Adv. Funct. Mater. 19/2012)

Andreas C. Fischer, Lyubov M. Belova, Yuri G. M. Rikers, B. Gunnar Malm, Henry H. Radamson, Mohammadreza Kolahdouz, Kristinn B. Gylfason, Göran Stemme, Frank Niklaus

Advanced Functional Materials· Volume 22· Issue 19
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Source abstract

Abstract

On page 4004, Frank Niklaus and co-workers report on the fabrication of 3D nanostructures by alternating steps of silicon deposition and local ion implantation by focused ion beam (FIB) writing. The defined 3D nanostructures are formed in a final step by selective silicon etching.
Source: openalex_inverted_index · Quality: baseline

Research context

NanomaterialsBiomaterialsMaterials processing

OpenAlex topics: Advanced Surface Polishing Techniques · Ion-surface interactions and analysis · Silicon and Solar Cell Technologies

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