Fabrication and characterization of NiO nanoparticles deposited via reactive DC magnetron sputtering technique

Nickel oxide (NiO) nanostructure was successfully prepared via reactive DC magnetron sputtering on the soda-lima glass substrate, which can be used for various applications. Xray diffraction (XRD) investigations were used to evaluate NiO with two annealing durations. The results revealed that the deposited films had a cubic structure and polycrystalline nanoparticles. A significant polycrystalline structure could be seen in the sputtered films as a diffraction peak oriented toward NiO (200). Field-emission Scanning Electron Microscopy (FE-SEM) analysis identified the surface morphology of NiO nanoparticles prepared at two different annealing times with the two average sizes (24 and 32 nm) respectively. The samples' roughness was assessed using atomic force microscopy (AFM). Increased annealing time was shown to result in a decrease in grain size. The energy band gap (Eg) expanded with increasing annealing time, according to UV-visible spectroscopy (UV-Vis). FTIR spectroscopy was used to determine the functional groups of NiO nanoparticles and their bonding nature. The results indicate that optical characterizations are more sensitive to the annealing period.