journal article·2021-07Open access

Effect of current density on electrodeposited cobalt ferrous tungsten magnetic thin films

Department of Physics, Vivekanandha College of Engineering for Women, Tiruchengode 637 205, Tamil Nadu, India, T. Aruna Christy, N. Thangaraj, Department of Physics, Velalar College of Engineering and Technology, Erode 638 012, Tamil Nadu, India, D. Sasikumar, cDepartment of Physics, Arignar Anna Govt. Arts College, Namakkal 637 002, Tamil Nadu, India

Abstract

Co-Fe-W electrodeposited magnetic thin film properties were studied to identify the possible applications in different area. The film was prepared using the electrodeposition method with different current densities, in order to get the uniform deposition with different thickness. A vibrating sample magnetometer studies provide the value of magnetic saturation (Ms=0.112emu), retentivity (Mr=0.020emu) and coercivity (Hc=88.95Oe). The prepared film is (45min, thickness is 3.10μm) more suitable to develop tiny integrated memory devices. X-ray diffraction studies (XRD) confirm the cubic crystalline nature of the prepared thin films. Surface morphology analysis clearly shows the uniform thickness (0.2 μm) of the thin film [scanning electron microscope (SEM)]. The highest percentage of Co, Fe and W composition in the thin films were obtained by using energy dispersive X-ray analysis. The maximum hardness value is 212/7.5 mAcm2 for 45min and best adhesion with desirable magnetic properties have been reported in the present communication.
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Research context

OpenAlex topics: Electrodeposition and Electroless Coatings · Magnetic properties of thin films · ZnO doping and properties

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