What makes a dangling bond a binding site for thermal CH3 radicals? — A combined molecular dynamics and potential energy analysis study on amorphous hydrocarbon films

Abstract Identification of dangling bonds on amorphous films is not as straight forward as in the case of crystalline materials. The task is further complicated in the case of amorphous hydrocarbon (a-C:H) films by the existence of a wide variety of atomic arrangements. We present a technique based on potential energy analysis of a-C:H films to identify dangling bonds and physisorption sites. However, molecular dynamics simulations of the sticking of thermal CH 3 on a-C:H surfaces show that not all dangling bonds are binding sites for a CH 3 radical. Furthermore, the total sticking coefficient of the surface is not solely linked to the number of dangling bonds and can even decrease for the same number of dangling bonds because the carbon atoms that possess a binding site, active carbon atoms , show drastically different reactivity towards CH 3 . The reactivity of active carbon atoms is decided by (a) their type, which is decided by the bonding partners, (b) their distance from the local surface and (c) the local environment. The reactivity of the active carbon atoms can be largely increased by energetic ion bombardment due to hydrogen depletion and local rearrangement.