journal article·1996-04

Modeling diamond chemical vapor deposition in a rotating disk reactor

Dean E. Kassmann, Thomas A. Badgwell

Diamond and Related Materials· Volume 5· Issue 3-5
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Abstract

No abstract is available for this record. The assistant can identify its topic from the title, but cannot infer the study’s results.

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Research context

OpenAlex topics: Diamond and Carbon-based Materials Research · Laser-induced spectroscopy and plasma · High-pressure geophysics and materials

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References (6)

Show source-provided references
1. A mathematical model of the fluid mechanics and gas-phase chemistry in a rotating disk chemical vapor deposition reactor10.1149/1.2096750 ↗
2. Numerical modelling of the filament-assisted diamond growth environment10.1063/1.346858 ↗
3. Forced flow near a heated rotating disk: a similarity solution
4. Analysis of diamond growth in subatmospheric dc plasma-gun reactors10.1063/1.354201 ↗
5. Spin (version 3.83): a Fortran program for modeling one-dimentional rotating-disk/stagnation-flow chemical vapor deposition reactors
6. Analysis of process modifications for efficient diamond chemical vapor deposition10.1016/0925-9635(95)00441-6 ↗