DataVXAdvanced Functional MaterialsPaper
journal article·2014-05

Micropattern Formation by Molecular Migration via UV‐induced Dehydration of Block Copolymers

Kenji Okada, Yasuaki Tokudome, Rie Makiura, Kristina Konstas, Luca Malfatti, Plinio Innocenzi, Hiroki Ogawa, Toshiji Kanaya, Paolo Falcaro, Masahide Takahashi

Advanced Functional Materials· Volume 24· Issue 19
Publisher page
Source abstract

Abstract

A novel UV lithographic technique for the patterning of the block copolymer (Pluronic) thin films is developed. The present method is based on UV‐induced water affinity changes in block copolymer films. By water vapor post‐treatment of the film, a difference in water content is established between UV illuminated and unilluminated sections, which can induce an osmotic pressure at the interface. This osmotic pressure drives the migration of Pluronic molecules, resulting in formation of patterns on the block copolymer films. Remarkably, this patterning method requires neither initiators nor polymerizable moieties which are essential for a conventional photolithographic approach. Additionally, the etching process is bypassed, eliminating the use of destructive acids or organic solvents and making this an environmentally friendly patterning protocol. It is reported that Pluronic is photo‐responsive to UV exposure, which causes the dehydration of the PEO‐PPO‐PEO backbone.
Source: crossref · Quality: baseline

Research context

Polymers

OpenAlex topics: Block Copolymer Self-Assembly · Advanced Polymer Synthesis and Characterization · Nanofabrication and Lithography Techniques

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Department of Materials Science Graduate School of Engineering, Osaka Prefecture University Sakai Osaka 599‐8531 Japan

International Laboratory of Materials Science and Nanotechnology, Osaka Prefecture University Sakai Osaka 599‐8531 Japan

Nanoscience and Nanotechnology Research Center Osaka Prefecture University Sakai Osaka 599‐8531 Japan

PRESTO, Japan Science and Technology Agency 4‐1‐8 Honcho Kawaguchi Saitama 332‐0012 Japan

Division of Materials Science and Engineering, CSIRO Private Bag 33, Clayton South MDC Victoria 3169 Australia

Laboratorio di Scienza dei Materiali e Nanotecnologie (LMNT) CR‐INSTM, Universita di Sassari Palazzo Pou Salit. Alghero SS Italy

Japan Synchrotron Radiation Research Institute (JASRI/SPring‐8) Sayo Hyogo Japan

Institute for Chemical Research, Kyoto University Uji Kyoto 611‐0011 Japan

References (54)

Show source-provided references
1. 10.1038/nmat129510.1038/nmat1295 ↗
2. 10.1002/anie.20120031010.1002/anie.201200310 ↗
3. 10.1016/S1369-7021(06)71619-410.1016/S1369-7021(06)71619-4 ↗
4. 10.1002/adma.20120325410.1002/adma.201203254 ↗
5. 10.1002/adma.20070293010.1002/adma.200702930 ↗
6. 10.1021/nn305295610.1021/nn3052956 ↗
7. 10.1021/ma071073710.1021/ma0710737 ↗
8. 10.1002/adma.20030490610.1002/adma.200304906 ↗
9. 10.1021/ma101694n10.1021/ma101694n ↗
10. Nie Z. · Nat. Mater. · 2008 · 2 · 27710.1038/nmat2109 ↗
11. 10.1002/1521-4095(200103)13:6<421::AID-ADMA421>3.0.CO;2-#10.1002/1521-4095(200103)13:6<421::AID-ADMA421>3.0.CO;2-# ↗
12. 10.1002/adma.20029001810.1002/adma.200290018 ↗
13. 10.1002/1521-4095(200108)13:15<1174::AID-ADMA1174>3.0.CO;2-Q10.1002/1521-4095(200108)13:15<1174::AID-ADMA1174>3.0.CO;2-Q ↗
14. 10.1021/nn200647d10.1021/nn200647d ↗
15. 10.1002/adfm.20130046910.1002/adfm.201300469 ↗
16. 10.1002/1521-4095(200108)13:15<1152::AID-ADMA1152>3.0.CO;2-510.1002/1521-4095(200108)13:15<1152::AID-ADMA1152>3.0.CO;2-5 ↗
17. 10.1002/adma.20100166910.1002/adma.201001669 ↗
18. 10.1038/3776410.1038/37764 ↗
19. 10.1038/3501102610.1038/35011026 ↗
20. 10.1126/science.290.5489.10710.1126/science.290.5489.107 ↗
21. 10.1039/c2sm07028f10.1039/c2sm07028f ↗
22. 10.1002/smll.20120273510.1002/smll.201202735 ↗
23. 10.1021/la047743910.1021/la0477439 ↗
24. 10.1021/nn800150510.1021/nn8001505 ↗
25. 10.1021/cm049344510.1021/cm0493445 ↗
26. 10.1002/adma.20030618910.1002/adma.200306189 ↗
27. 10.1021/cm300093e10.1021/cm300093e ↗
28. 10.1021/la304931x10.1021/la304931x ↗
29. 10.1002/adma.20070279510.1002/adma.200702795 ↗
30. 10.1038/ncomms123410.1038/ncomms1234 ↗
31. 10.1016/S0168-3659(02)00009-310.1016/S0168-3659(02)00009-3 ↗
32. 10.1002/adma.20030561310.1002/adma.200305613 ↗
33. 10.1021/am100149e10.1021/am100149e ↗
34. 10.1021/la962033r10.1021/la962033r ↗
35. 10.1021/cm071784j10.1021/cm071784j ↗
36. 10.1021/ja030070g10.1021/ja030070g ↗
37. 10.1021/ja974025i10.1021/ja974025i ↗
38. 10.1021/jp901909w10.1021/jp901909w ↗
39. 10.1021/ma020621810.1021/ma0206218 ↗
40. 10.1021/jp908162z10.1021/jp908162z ↗
41. 10.1021/la802656a10.1021/la802656a ↗
42. 10.1021/ma901779510.1021/ma9017795 ↗
43. 10.1021/ma400810u10.1021/ma400810u ↗
44. 10.1021/ma60035a00510.1021/ma60035a005 ↗
45. 10.1021/ma00130a01710.1021/ma00130a017 ↗
46. 10.1039/b916454e10.1039/b916454e ↗
47. 10.1021/ma010528410.1021/ma0105284 ↗
48. 10.1021/la020007p10.1021/la020007p ↗
49. 10.1016/0378-5173(85)90197-810.1016/0378-5173(85)90197-8 ↗
50. It should be noted that the measurement was impossible to carry out for Pluronic film because the thickness of the film is not enough to reveal the change of absorption intensity.
51. 10.1002/chem.20100215310.1002/chem.201002153 ↗
52. 10.1021/j100196a05310.1021/j100196a053 ↗
53. As a reference an MO aqueous solution (without Pluronic) exhibited no peak shift when the solution was exposed to UV illumination indicating that MO in aqueous solution is not UV‐active.
54. 10.1002/adfm.20090012710.1002/adfm.200900127 ↗