Highly-efficient flat electron emitter of single-crystalline CVD diamond
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Abstract
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Research context
OpenAlex topics: Diamond and Carbon-based Materials Research · Semiconductor materials and devices · Metal and Thin Film Mechanics
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References (18)
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1. See, for example, K.V. Ravi, J.P. Dismukes (Eds.), Diamond Materials, Electrochemical Society Inc., Pennington, 1995.
2. Himpsel · Phys. Rev. B · 1979 · 20 · 62410.1103/PhysRevB.20.624 ↗
3. Pate · Surf. Sci. · 1986 · 165 · 8310.1016/0039-6028(86)90665-5 ↗
4. van der Weide · Phys. Rev. B · 1994 · 50 · 580310.1103/PhysRevB.50.5803 ↗
5. Eimori · Jpn. J. Appl. Phys. · 1994 · 33 · 631210.1143/JJAP.33.6312 ↗
6. Eimori · Diamond Relat. Mater. · 1995 · 4 · 80610.1016/0925-9635(94)05324-3 ↗
7. Wang · Electron. Lett. · 1991 · 27 · 145910.1049/el:19910914 ↗
8. Xu · Electron. Lett. · 1993 · 29 · 159610.1049/el:19931063 ↗
9. Okano · Electron. Lett. · 1995 · 31 · 7410.1049/el:19950027 ↗
10. Hatta · Appl. Surf. Sci. · 1997 · 117, 118 · 59210.1016/S0169-4332(97)80148-1 ↗
11. Nishimura · Jpn. J. Appl. Phys. · 1998 · 37 · L101110.1143/JJAP.37.L1011 ↗
12. W.N. Wang, N.A. Fox, J.W. Steeds, Diamond Films Technol. to be published.
13. T. Ito, K. Ogawa, M. Deguchi, M. Kitabatake, A. Hatta, Diamond Relat. Mater. to be published.
14. Geis · IEEE Electron Device Lett. · 1991 · 12 · 45610.1109/55.119164 ↗
15. Brandes · Diamond Relat. Mater. · 1995 · 4 · 58610.1016/0925-9635(94)05267-0 ↗
16. J.F. Ziegler, J.P. Biersack, V. Littmark, The Stopping and Range of Ions in Solids, Pergamon Press, New York, 1985.10.1007/978-1-4615-8103-1_3 ↗
17. N.S. Xu, in: R.V. Latham (Ed.), High Voltage Vacuum Insulation, Academic Press, London, 1995, p. 115.10.1016/B978-012437175-0/50008-7 ↗
18. Ito · Appl. Phys. Lett. · 1998 · 73 · 373910.1063/1.122879 ↗