Extensive diamond film deposition by d.c. plasma jet chemical vapor deposition

E. Lugscheider; W. Schlump; F. Deuerler; P. Remer

doi:10.1016/0925-9635(94)90179-1

journal article·1994-04

Extensive diamond film deposition by d.c. plasma jet chemical vapor deposition

E. Lugscheider, W. Schlump, F. Deuerler, P. Remer

Diamond and Related Materials· Volume 3· Issue 4-6

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Abstract

No abstract is available for this record. The assistant can identify its topic from the title, but cannot infer the study’s results.

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Research context

Materials processing

OpenAlex topics: Diamond and Carbon-based Materials Research · Metal and Thin Film Mechanics · High-pressure geophysics and materials

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

References (10)

Show source-provided references

1. Diamond deposition technologies10.1016/0925-9635(92)90073-W ↗

2. High rate synthesis of diamond by d.c. plasma jet chemical vapor deposition10.1063/1.99435 ↗

3. Diamond film preparation by arc discharge plasma jet CVD and thermodynamic calculation of the equilibrium gas composition10.1016/0925-9635(92)90062-S ↗

4. Diamant aus heißen Gasen

5. Rapid synthesis of diamond by counter-flow liquid injection into an atmospheric pressure plasma jet10.1016/0925-9635(92)90011-C ↗

6. Synthesis using d.c. plasma jet CVD

7. Advanced diamond coatings by d.c.-plasma-jet CVD

8. Diamond-ceramic coating of the future10.1111/j.1151-2916.1989.tb06099.x ↗

9. Synthese von kristallinen Diamantschichten mit Hilfe des Vakuumplasmaspritzens

10. Diamond coating by d.c. plasma jet deposition