DataVXAdvanced Functional MaterialsPaper
journal article·2025-06Open access

Tin‐Oxo Nanocluster Composite Films as Positive‐Tone Photoresist for Extreme UV Lithography (Adv. Funct. Mater. 24/2025)

Gayoung Kim, Yejin Ku, Subin Jeon, Jin‐Kyun Lee, Seohyeon Lee, Byung Jun Jung, Sung‐Il Lee, Choonghan Ryu, Kangho Park, Yun Lim Jung, Changyoung Jeong, Jin Choi

Advanced Functional Materials· Volume 35· Issue 24
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Source abstract

Abstract

Tin-Oxo Nanoclusters This illustration depicts extreme ultraviolet (EUV)-induced structural changes in a photoresist system composed of Lewis acidic tin-oxo nanoclusters and Lewis basic polyphenols. Lewis acid-base interactions stabilize the film prior to exposure, while EUV irradiation triggers partial disassembly, promoting interactions with hydroxide ions in an aqueous developer. This chemistry enables the selective dissolution of exposed areas, leading to high-resolution positive-tone patterning. More information can be found in article number 2503002 by Jin-Kyun Lee, Jin Choi, and co-workers.
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Research context

NanomaterialsComposites

OpenAlex topics: Transition Metal Oxide Nanomaterials · Gold and Silver Nanoparticles Synthesis and Applications · Synthesis and properties of polymers

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Affiliations

Program in Environment and Polymer Engineering Inha University Incheon 22212 Republic of Korea

Program in Semiconductor Convergence Inha University Incheon 22212 Republic of Korea

Department of Polymer Science and Engineering Inha University Incheon 22212 Republic of Korea

Department of Materials Science and Engineering University of Seoul Seoul 02504 Republic of Korea

Samsung Electronics Co. Ltd. Semiconductor R&D Center Gyeonggi‐do 18448 Republic of Korea

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