journal article·2006-06

Electrochemical metal deposition on silicon

Y OGATA, K KOBAYASHI, M MOTOYAMA

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Abstract

Electrochemical metal deposition is utilized to fabricate micro- and nano-structures. A variety of the structures have been achieved in metal patterning and structuring and also in the structure formation of silicon itself. The controlling factors and conditions of the size, morphology and distribution have been investigated. The importance of metal deposition by displacement reaction should be recognized.
Source: openaire · Quality: candidate unverified · Source record ↗

Research context

OpenAlex topics: Anodic Oxide Films and Nanostructures · Nanowire Synthesis and Applications · Semiconductor materials and interfaces

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