journal article·2016-11

Conductive Graphitic Channel in Graphene Oxide‐Based Memristive Devices

Sung Kyu Kim, Jong Yoon Kim, Byung Chul Jang, Mi Sun Cho, Sung‐Yool Choi, Jeong Yong Lee, Hu Young Jeong

Advanced Functional Materials· Volume 26· Issue 41
Publisher page

Abstract

Electrically insulating graphene oxide with various oxygen‐functional groups is a novel material as an active layer in resistive switching memories via reduction process. Although many research groups have reported on graphene oxide‐based resistive switching memories, revealing the origin of conducting path in a graphene oxide active layer remains a critical challenge. Here nanoscale conductive graphitic channels within graphene oxide films are reported using a low‐voltage spherical‐aberration‐corrected transmission electron microscopy. Simultaneously, these channels with reduced graphene oxide nanosheets induced by the detachment of oxygen groups are verified by Raman intensity ratio map and conductive atomic force microscopy. It is also clearly revealed that Al metallic protrusions, which are generated in the bottom interface layer, assist the local formation of conductive graphitic channels directly onto graphene oxide films by generating a local strong electric field. This work provides essential information for future carbon‐based nanoelectronic devices.
Source: crossref · Quality: baseline

Research context

OpenAlex topics: Advanced Memory and Neural Computing · Neuroscience and Neural Engineering · Transition Metal Oxide Nanomaterials

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Center for Nanomaterials and Chemical Reactions Institute for Basic Science (IBS) 70 Yuseong‐daero 1689‐gil Yuseong‐gu, Daejeon 34047 South Korea

Department of Materials Science and Engineering Korea Advanced Institute of Science and Technology (KAIST) 291 Daehak‐ro Yuseong‐gu, Daejeon 34141 South Korea

Graphene Research Center and School of Electrical Engineering Korea Advanced Institute of Science and Technology (KAIST) 291 Daehak‐ro Yuseong‐go, Daejeon 34141 South Korea

UNIST Central Research Facilities (UCRF), Ulsan National Institute of Science and Technology (UNIST) 50 UNIST‐gil Ulsan 44919 South Korea

Funding

Ministry of Education · Ulsan National Institute of Science and Technology

References (56)

Show source-provided references
1. 10.1038/nmat202310.1038/nmat2023 ↗
2. 10.1038/srep0389010.1038/srep03890 ↗
3. 10.1002/adma.20060256410.1002/adma.200602564 ↗
4. 10.1038/nmat307010.1038/nmat3070 ↗
5. 10.1038/ncomms338210.1038/ncomms3382 ↗
6. 10.1002/adma.20090037510.1002/adma.200900375 ↗
7. 10.1038/nnano.2012.24010.1038/nnano.2012.240 ↗
8. 10.1103/RevModPhys.81.10910.1103/RevModPhys.81.109 ↗
9. 10.1039/c2cs35043b10.1039/c2cs35043b ↗
10. 10.1002/adma.20120334910.1002/adma.201203349 ↗
11. 10.1021/nl202157510.1021/nl2021575 ↗
12. 10.1063/1.486275510.1063/1.4862755 ↗
13. 10.1021/nn305913610.1021/nn3059136 ↗
14. 10.1002/adfm.20150418710.1002/adfm.201504187 ↗
15. 10.1021/ja01539a01710.1021/ja01539a017 ↗
16. 10.1039/B917103G10.1039/B917103G ↗
17. 10.1038/nnano.2007.45110.1038/nnano.2007.451 ↗
18. 10.1109/LED.2010.205369510.1109/LED.2010.2053695 ↗
19. 10.1021/nl101902k10.1021/nl101902k ↗
20. 10.1002/adfm.20150273410.1002/adfm.201502734 ↗
21. 10.1016/j.carbon.2015.01.01110.1016/j.carbon.2015.01.011 ↗
22. 10.1038/nature0771910.1038/nature07719 ↗
23. 10.1021/nl304246d10.1021/nl304246d ↗
24. 10.1016/j.carbon.2011.04.07110.1016/j.carbon.2011.04.071 ↗
25. 10.1063/1.368136610.1063/1.3681366 ↗
26. 10.1063/1.327117710.1063/1.3271177 ↗
27. 10.1021/nn101421510.1021/nn1014215 ↗
28. 10.1063/1.361981510.1063/1.3619815 ↗
29. 10.1039/C1CC15945C10.1039/C1CC15945C ↗
30. 10.1016/j.carbon.2015.02.06110.1016/j.carbon.2015.02.061 ↗
31. 10.1021/nn202187510.1021/nn2021875 ↗
32. 10.1002/smll.20120194010.1002/smll.201201940 ↗
33. 10.1016/j.carbon.2013.07.05110.1016/j.carbon.2013.07.051 ↗
34. 10.1063/1.362494710.1063/1.3624947 ↗
35. 10.1021/nl500049g10.1021/nl500049g ↗
36. 10.1002/adma.20120150610.1002/adma.201201506 ↗
37. 10.1039/C0NR00580K10.1039/C0NR00580K ↗
38. 10.1038/nnano.2009.45610.1038/nnano.2009.456 ↗
39. 10.1063/1.281361710.1063/1.2813617 ↗
40. 10.1021/nl401563810.1021/nl4015638 ↗
41. 10.1088/0957-4484/20/21/21520110.1088/0957-4484/20/21/215201 ↗
42. 10.1002/adfm.20100125410.1002/adfm.201001254 ↗
43. 10.1103/PhysRev.97.153810.1103/PhysRev.97.1538 ↗
44. An C. · IEEE Int. Electron Dev. Meet. Tech. Dig. · 2005 · 746
45. 10.1109/LED.2011.210903210.1109/LED.2011.2109032 ↗
46. 10.1063/1.283485210.1063/1.2834852 ↗
47. 10.1021/nl072090c10.1021/nl072090c ↗
48. 10.1021/jp905140210.1021/jp9051402 ↗
49. 10.1103/PhysRevB.86.23542310.1103/PhysRevB.86.235423 ↗
50. 10.1002/adma.20090368910.1002/adma.200903689 ↗
51. Wang Z. · Nanoscale · 2016 · 22 · 2392
52. 10.1002/adma.20080220110.1002/adma.200802201 ↗
53. 10.1021/cm950283810.1021/cm9502838 ↗
54. 10.1021/jp400573w10.1021/jp400573w ↗
55. 10.1016/S0968-4328(99)00132-810.1016/S0968-4328(99)00132-8 ↗
56. 10.1021/nl803425610.1021/nl8034256 ↗