Conductive SU8 Photoresist for Microfabrication
Source abstract
Abstract
Abstract A conductive composite photoresist has been developed for the direct photopatterning of electrodes. It is based on a dispersion of silver nanoparticles in SU8, a non‐conductive, negative‐tone photoresist. Manufactured structures have an electrical conductivity at a low silver content of around 6 vol.‐%.
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Research context
OpenAlex topics: Microfluidic and Capillary Electrophoresis Applications · Microfluidic and Bio-sensing Technologies · Electrohydrodynamics and Fluid Dynamics
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