Behavior of phosphatidylcholine adsorption on CN coated PTFE films

Abstract In order to expand the applicability of PTFE for artificial replacement, the CN x coatings which could influence lipid adsorption are of considerable relevance. The intention of this study is to gain first information about the influence of CN x coating on the phosphatidylcholine (PC) adsorption of PTFE. By means of ion beam assisted deposition (IBAD), the CN x films can have a strongly bond to the PTFE substrates as a wide atomic intermixed zone that is formed at the surface. The characterization of the CN structures under different bombarding conditions was carried out by Raman and SEM as well as XPS measurements. For characterizing the behavior, analysis of PC adsorption was illuminated where Fourier transform infrared spectroscopy of attenuated total internal reflection mode (ATR-FTIR) was used as principal instrument. Results point to an increase of nitrogen content and sp 2 /sp 3 fraction under higher bombarding voltage which seems to play a dominant role for the biological characters and a dramatic restraining of lipid deposition was induced on CN x coated PTFE compared with the uncoated samples.