Enhanced Thermal Transport across Self‐Interfacing van der Waals Contacts in Flexible Thermal Devices
Source abstract
Abstract
Abstract Minimizing the thermal contact resistance (TCR) at the boundary between two bodies in contact is critical in diverse thermal transport devices. Conventional thermal contact methods have several limitations, such as high TCR, low interfacial adhesion, a requirement for high external pressure, and low optical transparency. Here, a self‐interfacing flexible thermal device (STD) that can form robust van der Waals mechanical contact and low‐resistant thermal contact to planar and non‐planar substrates without the need for external pressure or surface modification is presented. The device is based on a distinctive integration of a bioinspired adhesive architecture and a thermal transport layer formed from percolating silver nanowire (AgNW) networks. The proposed device exhibits a strong attachment (maximum 538.9 kPa) to target substrates while facilitating thermal transport across the contact interface with low TCR (0.012 m2 K kW−1) without the use of external pressure, thermal interfacial materials, or surface chemistries.
Source: crossref · Quality: baseline
Research context
OpenAlex topics: Thermal properties of materials · Adhesion, Friction, and Surface Interactions · Advanced Thermoelectric Materials and Devices
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
Affiliations
Department of Mechanical Engineering Ulsan National Institute of Science and Technology (UNIST) Ulsan 44919 Republic of Korea
Department of Physics Kyungpook National University Daegu 41566 Republic of Korea
Funding
National Research Foundation of Korea · Institute for Information and Communications Technology Promotion
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