Utilizing the Sensitization Effect for Direct Laser Writing in a Novel Photoresist Based on the Chitin Monomer N‐acetyl‐D‐glucosamine
Source abstract
Abstract
In article number 2201688, Dominic T. Meiers, Cordt Zollfrank, Georg von Freymann, and co-workers present a new photoresist which enables direct laser writing of rigid structures made from the monomeric unit of chitin. In addition, they demonstrate a way to significantly increase the writing speed by transferring the sensitization effect from one- to two-photon absorption.
Source: openalex_inverted_index · Quality: baseline
Research context
OpenAlex topics: Nonlinear Optical Materials Studies
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Affiliations
Physics Department and Research Center OPTIMAS RPTU Kaiserslautern‐Landau 67663 Kaiserslautern Germany
Chair for Biogenic Polymers Technische Universität München 94315 Straubing Germany
Department of Materials Characterization and Testing Fraunhofer Institute for Industrial Mathematics ITWM 67663 Kaiserslautern Germany
References
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