Contents: Adv. Eng. Mater. 4∕2016
Source abstract
Abstract
The cover picture illustrates transparent domeshaped micro cavities: a conventional positive photoresist releases nitrogen (N 2 ) gas when exposed to UV light; therefore, by covering a patterned photoresist with a negative tone polymer such as SU-8, the patterned photoresist and SU-8 stacked layers are spontaneously infl ated during UV light exposure. Further details can be found in the article by C.-H. Han and co-workers on page 559.
Source: openalex_inverted_index · Quality: baseline
Research context
OpenAlex topics: Additive Manufacturing Materials and Processes · Laser Material Processing Techniques · Metallurgical and Alloy Processes
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
References
Reference metadata was not supplied for this record.