Fabrication of PtIrPd Noble Metal Medium Entropy Alloy Thin Film by Atomic Layer Deposition
Source abstract
Abstract
Noble metal-based (Pt, Ir, Pd) medium entropy alloy (MEA) thin film has been fabricated by sequential atomic layer deposition (ALD), followed by electric Joule heating as described in the article number 2201263 by Kwan W. Tan, Alfred Iing Yoong Tok and co-workers. This novel two-step method gives precise thickness control and tunable atomic ratio of the MEA thin film. The PtIrPd MEA thin film with thickness of ≈20 nm has been successfully fabricated.
Source: openalex_inverted_index · Quality: baseline
Research context
OpenAlex topics: High Entropy Alloys Studies · High-Temperature Coating Behaviors · Advanced Materials Characterization Techniques
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Affiliations
School of Materials Science and Engineering Nanyang Technological University Singapore 639798 Singapore
References
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