Quantitative Model of FIB Deposition

A quantitative theory for patterned depositions in focused ion beam (FIB) machines is developed The theory describes local deposition speed in terms of instrumental (beam current, beam diameter, scanning frequency, precursor flux, pattern size, ...) and process parameters (deposition cross section, number of adsorption sites, sputtering yield, ...). The theory is experimentally validated; for the case of deposition of tungsten and platinum numerical values of process parameters are determined from experimental measurements of deposition speed.