Layer‐by‐Layer Interference Lithography of Three‐dimensional Microstructures in SU‐8

We report on rapid fabrication of two-, two and a half-, and 3D planar periodic structures using layer-by-layer deposition and interference patterning of SU-8 photoresist. Complex structures with non-periodic vertical symmetry were fabricated controlling the cure depth by addition of a UV absorber. The fabrication method reported here can be applied for the high-volume manufacturing of solid structures for microelectromechanical systems and microfluidic devices.