The Effect of Stress Relaxation on the Microstructure and Hardness Evolution of Pure Amorphous‐Carbon and C/Ti Multilayer Films
Source abstract
Abstract
Abstract Pure amorphous‐carbon (a‐C) and C/Ti multilayer films are prepared by pulsed‐laser deposition. For each fluence (7 or 10 J cm−2), a‐C films are deposited with two durations (35 and 120 min) to vary the thickness. The thin films have an sp3 bond ratio and hardness dependant on the fluence. The as‐deposited, thick a‐C films delaminate and provide a more‐nanosized graphitic microstructure, and a lower sp3 bond ratio and hardness compared to thin a‐C films, correlating with stress relaxation of the films. The C/Ti multilayer films can be deposited at large thicknesses due to the low internal stress, while the sp3 bond ratio and the hardness increase with decreasing thickness of the Ti bilayer.
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Research context
OpenAlex topics: Diamond and Carbon-based Materials Research · Metal and Thin Film Mechanics · Advanced materials and composites
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