Selective Nanoscale Fabrication with Roughness Reduction of Polycrystalline Silicon by Physically Induced Fluorine Bonds Using Atomic Force Microscope
Source abstract
Abstract
To overcome the limitations of the conventional polycrystalline silicon fabrication method, a novel method is developed as described in the article number 2300255 by Taesung Kim and co-workers. Mechanical force induced the covalent bonds between Si and F atoms which cause a phase transition. Then, the bond structure is weakened and selectively removed by AFM. The proposed mechanism achieved simple, selective, nanoscale, and highly efficient removal with roughness control.
Source: openalex_inverted_index · Quality: baseline
Research context
OpenAlex topics: Advanced Surface Polishing Techniques · Nanofabrication and Lithography Techniques · Force Microscopy Techniques and Applications
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
Affiliations
Mechanical Engineering Sungkyunkwan University Suwon-Si Gyeonggi-Do 440-746 Korea
SKKU Advanced Institute of Nanotechnology (SAINT) Sungkyunkwan University Suwon 16419 Korea
Department of Nano Science and Technology Sungkyunkwan University Suwon 16419 Korea
Department of Nano Engineering Sungkyunkwan University Suwon 16419 Korea
References
Reference metadata was not supplied for this record.