Unraveling the Highly Plastic Behavior of ALD‐Aluminum Oxide Encapsulations by Small‐Scale Tensile Testing
Source abstract
Abstract
We present a study directly measuring the electron‐beam‐induced plasticity of amorphous Al 2 O 3 coatings. Core–shell nanostructures are employed as small‐scale model systems for two‐dimensional coatings made by atomic layer deposition (ALD). Copper nanowires (NWs) are used as substrates for ALD deposition, representing a model system for interconnects commonly found in integrated circuits. Experiments are performed in situ in a transmission electron microscope (TEM) and further analyzed with electron energy loss spectroscopy (EELS). Our in situ TEM tensile experiments reveal the highly plastic behavior of the ALD shell, which withstands a maximum strain of 188%. Comparable samples under beam‐off conditions show a brittle fracture, which underlines the effect of electron irradiation. The electron‐beam‐activated bond switching within the amorphous network enables compensation of the applied tensile strain, leading to viscous flow. By incorporating an intermediate nanocrystalline layer within the Al 2 O 3 shell, the plasticity is suppressed and brittle fracture occurs. This work directly demonstrates the tuning of mechanical properties in amorphous ALD structures through electron irradiation.
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Research context
OpenAlex topics: Semiconductor materials and devices · Advanced ceramic materials synthesis · ZnO doping and properties
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
Affiliations
Laboratory for Mechanics of Materials & Nanostructures Swiss Federal Laboratories for Materials Science and Technology (Empa) Thun 3603 Switzerland
Department of Materials Science and Engineering University of California Berkeley CA 94720 USA
Lawrence Berkeley National Laboratory Molecular Foundry National Center for Electron Microscopy (NCEM) Berkeley CA 94720 USA
Funding
Energy Frontier Research Centers · Basic Energy Sciences
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