An Additively Manufactured Wide Angle and Broadband Electromagnetic Camouflage Metasurface
Source abstract
Abstract
Metasurface reveals distinguished application prospects profiting from its excellent manipulating capacity for electromagnetic (EM) wave using ultrathin thickness and the simple design method. Easy to conformal metasurface with high performance and integrated EM functions is highly in demand in many EM devices. Herein, an arched dual‐wavelength cloaking–illusion‐integrated metasurface consisting of two‐layer meta‐atoms is proposed successfully. A composite‐fused deposition molding packaging strategy of additive manufacturing is explored to fabricate the multilayer structures for metal meta‐atoms and dielectric substrates simultaneously. Simulation and measurement results show that the arched metasurface possesses polarization‐insensitive cloaking and illusion functions in 4.3–4.8 and 14.8–16.3 GHz, respectively. The effective incidence angle range covers from −45° to 45°. The excellent EM camouflage performance proves the effectiveness of our design and fabricating strategy, which paths a way for multifunctional metasurface‐based devices.
Source: crossref · Quality: baseline
Research context
OpenAlex topics: Metamaterials and Metasurfaces Applications · Advanced Antenna and Metasurface Technologies · Antenna Design and Analysis
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
Affiliations
State Key Laboratory of Manufacturing System Engineering Xi'an Jiaotong University Xi'an 710049 P. R. China
Funding
National Natural Science Foundation of China
References (41)
Show source-provided references
1. 10.1126/science.121071310.1126/science.1210713 ↗
2. 10.1002/adom.20140055710.1002/adom.201400557 ↗
3. 10.1038/ncomms380710.1038/ncomms3807 ↗
4. 10.1063/1.482489810.1063/1.4824898 ↗
5. 10.1126/science.aac941110.1126/science.aac9411 ↗
6. 10.1002/adma.20160062510.1002/adma.201600625 ↗
7. Wang R. · IEEE Photonics J. · 2017 · 9 · 4600809
8. 10.1038/nmat383910.1038/nmat3839 ↗
9. 10.1021/acsphotonics.7b0103610.1021/acsphotonics.7b01036 ↗
10. Xu H. X. · Research · 2021 · 3 · 341
11. 10.1002/adpr.20210010210.1002/adpr.202100102 ↗
12. 10.1038/s41467-022-31902-310.1038/s41467-022-31902-3 ↗
13. 10.1002/advs.20210264610.1002/advs.202102646 ↗
14. 10.1021/acsnano.1c1010010.1021/acsnano.1c10100 ↗
15. 10.1002/adom.20210060910.1002/adom.202100609 ↗
16. 10.1038/s41378-020-00226-x10.1038/s41378-020-00226-x ↗
17. 10.3390/s2114478410.3390/s21144784 ↗
18. Fan X. Q. · J. Phys. D · 2021 · 55 · 065103
19. 10.3390/nano1102026010.3390/nano11020260 ↗
20. 10.1016/j.optmat.2022.11248910.1016/j.optmat.2022.112489 ↗
21. 10.1364/OE.44649710.1364/OE.446497 ↗
22. 10.1126/science.112590710.1126/science.1125907 ↗
23. 10.1103/PhysRevE.72.01662310.1103/PhysRevE.72.016623 ↗
24. 10.1088/1367-2630/14/1/01305410.1088/1367-2630/14/1/013054 ↗
25. 10.1103/PhysRevLett.101.20390110.1103/PhysRevLett.101.203901 ↗
26. 10.1038/nmat246110.1038/nmat2461 ↗
27. 10.1364/OE.26.03162510.1364/OE.26.031625 ↗
28. 10.1038/s41377-021-00507-810.1038/s41377-021-00507-8 ↗
29. 10.1002/adom.20160060610.1002/adom.201600606 ↗
30. 10.1002/adom.20180007310.1002/adom.201800073 ↗
31. Su Z. X. · Sci. Rep. · 2017 · 7
32. 10.7567/APEX.8.09260110.7567/APEX.8.092601 ↗
33. 10.1039/D0TC03899G10.1039/D0TC03899G ↗
34. 10.1007/s10762-019-00617-w10.1007/s10762-019-00617-w ↗
35. 10.1002/adom.20190047510.1002/adom.201900475 ↗
36. 10.1002/adom.20200082710.1002/adom.202000827 ↗
37. 10.1002/admt.20210147910.1002/admt.202101479 ↗
38. 10.1002/adom.20180007310.1002/adom.201800073 ↗
39. 10.1103/PhysRevApplied.17.05401210.1103/PhysRevApplied.17.054012 ↗
40. 10.1364/OE.26.01412310.1364/OE.26.014123 ↗
41. 10.1049/iet-map.2020.039610.1049/iet-map.2020.0396 ↗