journal article·2014-01

Microstructural Studies of Fluorine‐Implanted Titanium Aluminides for Enhanced Environmental Durability

Rossen A. Yankov, Andreas Kolitsch, Johannes von Borany, Frans Munnik, Sibylle Gemming, Alexander Alexewicz, Hartmut Bracht, Harald Rösner, Alexander Donchev, Michael Schütze

Advanced Engineering Materials· Volume 16· Issue 1
Publisher page

Abstract

Analysis data detailing the microstructure of fluorine-implanted γ-TiAl alloys are presented. Correlations are done among the shape of the F implant profiles, the F dose, and the quality of the resulting oxide scale after high-temperature exposure to air. It is shown that good oxidation protection is associated with Gaussian-type as-implanted F profiles coupled with optimal F doses over a narrow window of about 5.0–9.0 × 1017 cm−2.
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Research context

OpenAlex topics: Intermetallics and Advanced Alloy Properties · Titanium Alloys Microstructure and Properties · MXene and MAX Phase Materials

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Institute of Ion Beam Physics and Materials Research Helmholtz‐Zentrum Dresden‐Rossendorf e.V POB 510119 01314 Dresden Germany

Institute of Materials Physics University of Muenster Wilhelm‐Klemm‐Str. 10 D‐48149 Muenster Germany

DECHEMA Forschungsinstitut Theodor‐Heuss‐Allee 25 60486 Frankfurt am Main Germany

References (23)

Show source-provided references
1. 10.1016/S0966-9795(00)00073-X10.1016/S0966-9795(00)00073-X ↗
2. 10.1016/S0921-5093(01)01584-210.1016/S0921-5093(01)01584-2 ↗
3. 10.1002/352760211910.1002/3527602119 ↗
4. 10.1002/maco.1995046050310.1002/maco.19950460503 ↗
5. 10.1007/BF0322324410.1007/BF03223244 ↗
6. 10.1016/j.nimb.2010.08.00110.1016/j.nimb.2010.08.001 ↗
7. 10.4028/www.scientific.net/MSF.638-642.137410.4028/www.scientific.net/MSF.638-642.1374 ↗
8. 10.1016/j.jallcom.2006.12.15710.1016/j.jallcom.2006.12.157 ↗
9. 10.1016/S0010-938X(01)00062-210.1016/S0010-938X(01)00062-2 ↗
10. 10.1016/S0257-8972(02)00288-810.1016/S0257-8972(02)00288-8 ↗
11. Donchev A. · 2008 · 323
12. 10.1002/ppap.20093000710.1002/ppap.200930007 ↗
13. Anders A. · 2000
14. 10.4028/www.scientific.net/MSF.638-642.129410.4028/www.scientific.net/MSF.638-642.1294 ↗
15. Manova D. · Plasma Sources Sci. Technol. · 2001 · 10 · 423
16. 10.1016/S0966-9795(99)00032-110.1016/S0966-9795(99)00032-1 ↗
17. 10.1016/S0966-9795(01)00024-310.1016/S0966-9795(01)00024-3 ↗
18. 10.1016/0168-583X(94)00797-710.1016/0168-583X(94)00797-7 ↗
19. Ziegler J. F. · 1985
20. 10.1016/0168-583X(91)95167-C10.1016/0168-583X(91)95167-C ↗
21. 10.1007/978-1-4615-9062-0_210.1007/978-1-4615-9062-0_2 ↗
22. 10.1016/j.nimb.2007.01.06810.1016/j.nimb.2007.01.068 ↗
23. 10.1016/S0966-9795(03)00003-710.1016/S0966-9795(03)00003-7 ↗