Microstructure and Performances of TiN Coatings Deposited by High Power Impulse Magnetron Sputtering

TiN coatings deposited via high power impulse magnetron sputtering technology exhibit a dense microstructure, high hardness, and adhesion strength, enhancing the longevity of engineering components. This study systematically investigates the influence of N ₂ flow rate on the microstructure and mechanical properties of TiN coatings while maintaining a fixed Ar flow rate of 60 sccm and a substrate bias of −120 V. Results indicate that as the N ₂ flow rate increases, the surface morphology transitions from irregular shapes to pyramidal and eventually to tetrahedral shapes, while the cross‐sectional structure remains dense. The preferred orientation shifts from TiN (111) to TiN (200) with N ₂ flow rate increasing. Notably, the coatings achieve peak hardness (about 28.2 GPa) and elastic modulus (about 269.8 GPa) at an N ₂ flow rate of 25 sccm, alongside maximum compressive residual stress (about 5.09 GPa). Adhesion strength ranges from 47.6 to 61.2 N, demonstrating superior adhesion to the substrate. This research provides a theoretical for future investigations into the application of TiN coatings in various industrial contexts, highlighting their exceptional mechanical properties and potential for improved performance.