journal article·2022-02

Continuous Oxygen Vacancy Gradient in TiO2 Photoelectrodes by a Photoelectrochemical‐Driven “Self‐Purification” Process

Kwang Hee Kim, Chang‐Won Choi, Seokhyun Choung, Yoonjun Cho, Sungsoon Kim, Cheoulwoo Oh, Kug‐Seung Lee, Chang‐Lyoul Lee, Kan Zhang, Jeong Woo Han, Si‐Young Choi, Jong Hyeok Park

Advanced Energy Materials· Volume 12· Issue 7
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Abstract

Abstract Oxygen vacancies have been treated as an important material engineering tool to enhance catalytic performance; for instance, oxygen vacancies suppress charge recombination at the Schottky interface, and thus, the photocurrent can be improved. In this regard, the gradient distribution of oxygen vacancies in n‐type metal oxides produces the ideal band structure for minimizing e−/h+ recombination by efficient hole extraction; however, its achievement remains a daunting challenge. Here, a photoelectrochemical (PEC)‐driven “self‐purification” process is suggested, which can effectively generate a gradient distribution of oxygen vacancies in the thickness range of ≈9.5 nm. As a result, a charge transport efficiency of >95% can be achieved by efficient hole migration from the photoanode to the electrolyte. This unique protocol is expected to provide an advanced metal oxide photocatalyst and photoelectrochemical electrode that exhibit superior photocatalytic performance with enhanced charge separation.
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Research context

OpenAlex topics: Advanced Photocatalysis Techniques · TiO2 Photocatalysis and Solar Cells · Copper-based nanomaterials and applications

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Department of Chemical and Biomolecular Engineering Yonsei University 50 Yonsei‐ro, Seodaemun‐gu Seoul 03722 Republic of Korea

Department of Materials Science and Engineering Pohang University of Science and Technology (POSTECH) 77 Cheongam‐ro Pohang 37673 Republic of Korea

Department of Chemical Engineering Pohang University of Science and Technology (POSTECH) Gyeongbuk 37673 Republic of Korea

Beamline Division Pohang Accelerator Laboratory (PAL) 80 Jigok‐ro 127 beon‐gil Pohang 37673 Republic of Korea

Advanced Photonics Research Institute (APRI) Gwangju Institute of Science and Technology (GIST) Gwangju 61005 Republic of Korea

Institute of Optoelectronics and Nanomaterials MIIT Key Laboratory of Advanced Display Materials and Devices College of Materials Science and Engineering Nanjing University of Science and Technology Nanjing 210094 China

Institute for Convergence Research and Education in Advanced Technology Yonsei University Seoul 03722 Republic of Korea

Funding

National Research Foundation of Korea · Korea Basic Science Institute · Ministry of Education

References (51)

Show source-provided references
1. 10.1039/C8NR09666J10.1039/C8NR09666J ↗
2. 10.1038/nmat481010.1038/nmat4810 ↗
3. 10.1038/nnano.2008.16010.1038/nnano.2008.160 ↗
4. 10.1038/186003a010.1038/186003a0 ↗
5. 10.1002/anie.20160068710.1002/anie.201600687 ↗
6. 10.1103/PhysRevLett.87.26610410.1103/PhysRevLett.87.266104 ↗
7. 10.1021/am300835p10.1021/am300835p ↗
8. 10.1021/ja301267610.1021/ja3012676 ↗
9. 10.1039/C4CS00330F10.1039/C4CS00330F ↗
10. 10.1021/jacs.7b1099710.1021/jacs.7b10997 ↗
11. 10.1039/D0SE01305F10.1039/D0SE01305F ↗
12. 10.1038/natrevmats.2017.5010.1038/natrevmats.2017.50 ↗
13. 10.1038/nphoton.2012.17510.1038/nphoton.2012.175 ↗
14. 10.1039/C4EE01580K10.1039/C4EE01580K ↗
15. 10.1038/s41929-018-0055-z10.1038/s41929-018-0055-z ↗
16. 10.1039/C8CS00320C10.1039/C8CS00320C ↗
17. 10.1038/414625a10.1038/414625a ↗
18. 10.1021/nl504035j10.1021/nl504035j ↗
19. 10.1002/adfm.20150369210.1002/adfm.201503692 ↗
20. 10.1021/ja405550k10.1021/ja405550k ↗
21. 10.1021/ja710899q10.1021/ja710899q ↗
22. 10.1038/ncomms319510.1038/ncomms3195 ↗
23. 10.1038/s41467-020-18484-810.1038/s41467-020-18484-8 ↗
24. 10.1038/s41929-020-00522-910.1038/s41929-020-00522-9 ↗
25. 10.1063/1.494037010.1063/1.4940370 ↗
26. 10.1063/1.179625310.1063/1.1796253 ↗
27. 10.1038/s41563-019-0344-110.1038/s41563-019-0344-1 ↗
28. 10.1021/acscatal.0c0046210.1021/acscatal.0c00462 ↗
29. 10.1038/s41929-019-0325-410.1038/s41929-019-0325-4 ↗
30. 10.1021/acsenergylett.7b0083410.1021/acsenergylett.7b00834 ↗
31. 10.1021/acsaem.8b0167610.1021/acsaem.8b01676 ↗
32. 10.1039/C9DT03368H10.1039/C9DT03368H ↗
33. 10.1021/ja807897210.1021/ja8078972 ↗
34. 10.1021/cr400621z10.1021/cr400621z ↗
35. 10.1002/aenm.20160092310.1002/aenm.201600923 ↗
36. 10.1039/c3cp50927c10.1039/c3cp50927c ↗
37. 10.1021/nl201766h10.1021/nl201766h ↗
38. 10.1016/0009-2614(82)83672-510.1016/0009-2614(82)83672-5 ↗
39. 10.1103/PhysRevLett.97.16680310.1103/PhysRevLett.97.166803 ↗
40. 10.1143/JJAP.49.03110510.1143/JJAP.49.031105 ↗
41. 10.1021/acscatal.6b0148210.1021/acscatal.6b01482 ↗
42. 10.1021/acs.jpcc.6b0148110.1021/acs.jpcc.6b01481 ↗
43. 10.1063/1.315278310.1063/1.3152783 ↗
44. 10.1007/s11671-010-9591-410.1007/s11671-010-9591-4 ↗
45. 10.1103/PhysRevB.80.03541310.1103/PhysRevB.80.035413 ↗
46. 10.1039/C5EE03100A10.1039/C5EE03100A ↗
47. 10.1039/C5RA05200A10.1039/C5RA05200A ↗
48. 10.1039/C5CP04495B10.1039/C5CP04495B ↗
49. 10.1103/PhysRevB.54.1116910.1103/PhysRevB.54.11169 ↗
50. 10.1103/PhysRevB.50.1795310.1103/PhysRevB.50.17953 ↗
51. 10.1103/PhysRevLett.77.386510.1103/PhysRevLett.77.3865 ↗