Preparation of Mn2O3-CeO2 Dual Oxide-Modified Al2O3 Abrasives for Chemical Mechanical Polishing of SiC

1. G. Zhao, Z. Wei, W. Wang, D. Feng, A. Xu, W. Liu, and Z. Song, Review on modeling and application of chemical mechanical polishing. Nanotechnol. Rev. 9, 182 (2020). https://doi.org/10.1515/ntrev-2020-0016.10.1515/ntrev-2020-0016 ↗

2. W. Wang, X. Lu, X. Wu, Y. Zhang, R. Wang, D. Yang, and X. Pi, Chemical-mechanical polishing of 4H silicon carbide wafers. Adv. Mater. Interfaces 10, 2202369 (2023). https://doi.org/10.1002/admi.202202369.10.1002/admi.202202369 ↗

3. A. Li, J. Zhou, X. Niu, Z. Liu, Q. Ma, S. Song, M. Wang, and B. Hu, Advances and challenges in chemical mechanical polishing of silicon carbide: materials, mechanisms, and future directions. J. Mater. Chem. C 13, 22921 (2025). https://doi.org/10.1039/D5TC03256C.10.1039/D5TC03256C ↗

4. G. Pan, Z. Gu, Y. Zhou, T. Li, H. Gong, and Y. Liu, Preparation of silane modified SiO2 abrasive particles and their chemical mechanical polishing (CMP) performances. Wear 273, 100 (2011). https://doi.org/10.1016/j.wear.2011.05.044.10.1016/j.wear.2011.05.044 ↗

5. Y. He, G. Zhou, M. Tang, L. Fan, X. Gao, and J. Sun, Investigation on mechanism of mechanical activation and chemical reactions in CMP of diamond assisted by hydroxyl free radicals. Appl. Surf. Sci. 681, 161527 (2025). https://doi.org/10.1016/j.apsusc.2024.161527.10.1016/j.apsusc.2024.161527 ↗

6. R. Ding, H. Lei, L. Xu, and Y. Chen, Surface planarization of zirconia ceramic achieved by polyacrylamide grafted nanodiamond composite abrasives through chemical mechanical polishing. Ceram. Int. 48, 19900 (2022). https://doi.org/10.1016/j.ceramint.2022.03.265.10.1016/j.ceramint.2022.03.265 ↗

7. G. Chen, C. Du, Z. Ni, Y. Liu, and Y. Zhao, The effect of surface polarity on the CMP behavior of 6H-SiC substrates. Russ. J. Appl. Chem. 93, 832 (2020). https://doi.org/10.1134/S1070427220060099.10.1134/S1070427220060099 ↗

8. X. Song, J. Guo, C. Xu, Z. Dong, R. Kang, and S. Gao, Mechanistic insights into the synergistic effect of oxidizers and abrasives in chemical mechanical polishing of 4H-SiC wafer. Ceram. Int. 51, 43649 (2025). https://doi.org/10.1016/j.ceramint.2025.07.097.10.1016/j.ceramint.2025.07.097 ↗

9. J. Gong, W. Wang, W. Liu, and Z. Song, Polishing mechanism of CMP 4H-SiC crystal substrate (0001) Si surface based on an alumina (Al2O3) abrasive. Materials 17, 679 (2024). https://doi.org/10.3390/ma17030679.10.3390/ma17030679 ↗

10. W. Wei-Lei, L. Wei-Li, B. Lin-Sen, S. Zhi-Tang, and H. Jun-Chao, Surface modified alumina particles and their chemical mechanical polishing (CMP) behavior on C-plane (0001) sapphire substrate. J. Inorg. Mater. 32: 1109 (2017). https://doi.org/10.15541/jim2017003610.15541/jim20170036 ↗

11. W. Zhang, H. Lei, W. Liu, Z. Zhang, Y. Chen, X. Hu, and X. Ye, Effect of EDTA-modified alumina composite abrasive on the CMP performance of sapphire substrate. Mater. Chem. Phys. 312, 128651 (2024). https://doi.org/10.1016/j.matchemphys.2023.128651.10.1016/j.matchemphys.2023.128651 ↗

12. X. Chen, S. Chen, and H. Lei, Synthesis of a novel Al2O3@MIL-100 (Fe) composite abrasive and its application in 4H-SiC chemical mechanical polishing. Colloids Surf. A 725, 137502 (2025). https://doi.org/10.1016/j.colsurfa.2025.137502.10.1016/j.colsurfa.2025.137502 ↗

13. Y. Fan, Z. Zhang, X. Deng, J. Yu, H. Zhou, F. Meng, and J. Feng, Development of core–shell SiO2@A-TiO2 abrasives and novel photocatalytic chemical machinal polishing for atomic surface of fused silica. Appl. Surf. Sci. 652, 159293 (2024). https://doi.org/10.1016/j.apsusc.2024.159293.10.1016/j.apsusc.2024.159293 ↗

14. S. Kurokawa, T. Doi, O. Ohnishi, T. Yamazaki, Z. Tan, and T. Yin, Characteristics in SiC-CMP using MnO2 slurry with strong oxidant under different atmospheric conditions. MRS Online Proc. Libr. 1560, 301 (2013). https://doi.org/10.1557/opl.2013.903.10.1557/opl.2013.903 ↗

15. P. Zhang, H. Lei, Z. Zhang, J. Zhang, S. Chen, and X. Hu, Synthesis of Al2O3@MnO2 composite abrasives and their chemical mechanical polishing performance on silicon carbide (SiC). Ceram. Int. 50, 19935 (2024). https://doi.org/10.1016/j.ceramint.2024.10.1016/j.ceramint.2024 ↗

16. N. Xu, Z. Gao, Y. Huo, K. Gao, Y. Wang, G. Zhang, Y. Lin, and Z. Wang, Dual-pathway mechanism of Fe-doped CeO2 abrasives in photo-Fenton-assisted CMP of SiC. J. Rare Earths (2026). https://doi.org/10.1016/j.jre.2026.02.005.10.1016/j.jre.2026.02.005 ↗

17. Z. Li, L. Jin, Z. Cao, C. Zhang, X. Cao, G. Han, S. Peng, and Y. Liu, Development and characterization of a novel RE3+ doped Core-shell CeO2 abrasive system and its glass CMP investigations. Appl. Surf. Sci. 638, 158055 (2023). https://doi.org/10.1016/j.apsusc.2023.158055.10.1016/j.apsusc.2023.158055 ↗

18. M. Negahdary, G. Mazaheri, S. Rad, M. Hadi, R. Malekzadeh, M.M. Saadatmand, S. Rezaei-Zarchi, F. Pishbin, and M. Khosravian-Hemami, Direct electron transfer of hemoglobin on manganese III oxide-ag nanofibers modified glassy carbon electrode. Int. J. anal. Chem. 2012, 375831 (2012). https://doi.org/10.1155/2012/375831.10.1155/2012/375831 ↗

19. A.M. Bakr, A. Darwish, A.A. Azab, M.E. El Awady, A.A. Hamed, and A. Elzwawy, Structural, dielectric, and antimicrobial evaluation of PMMA/CeO2 for optoelectronic devices. Sci. Rep. 14, 2548 (2024). https://doi.org/10.1038/s41598-024-52840-8.10.1038/s41598-024-52840-8 ↗

20. X. Sun, W. Wang, G. Sun, J. Chen, L. Wang, and J. Bi, Enhancement of the mechanical properties of nacre-like alumina ceramic by the synergism of graphene oxide and Si3N4 whisker. Ceram. Int. 48, 941 (2022). https://doi.org/10.1016/j.ceramint.2021.09.178.10.1016/j.ceramint.2021.09.178 ↗

21. M.L. Rahman, M.S. Islam, M.F. Ahmed, B. Biswas, N. Sharmin, and A.J.M.T. Neger, Extraction and characterization of highly pure alumina (α, γ, and θ) polymorphs from waste beverage cans: a viable waste management approach. Arab. J. Chem. 16, 104518 (2023). https://doi.org/10.1016/j.arabjc.2022.104518.10.1016/j.arabjc.2022.104518 ↗

22. J. Alves Júnior and J. Baldo, The behavior of zeta potential of silica suspensions. New J. Glass Ceram. 04, 29 (2014). https://doi.org/10.4236/njgc.2014.42004.10.4236/njgc.2014.42004 ↗

23. F. Bayat, M. Pourmadadi, M.M. Eshaghi, F. Yazdian, and H. Rashedi, Improving release profile and anticancer activity of 5-fluorouracil for breast cancer therapy using a double drug delivery system: chitosan/agarose/γ-alumina nanocomposite@double emulsion. J. Cluster Sci. 34, 2565 (2023). https://doi.org/10.1007/s10876-023-02405-y.10.1007/s10876-023-02405-y ↗

24. A. Schrijnemakers, S. Andre, G. Lumay, N. Vandewalle, F. Boschini, R. Cloots, and B. Vertruyen, Mullite coatings on ceramic substrates: stabilisation of Al2O3–SiO2 suspensions for spray drying of composite granules suitable for reactive plasma spraying. J. Eur. Ceram. Soc. 29, 2169 (2009). https://doi.org/10.1016/j.jeurceramsoc.2009.01.031.10.1016/j.jeurceramsoc.2009.01.031 ↗

25. H. Lei, H. Lu, J. Luo, and X. Lu, Preparation of α-alumina-g-polyacrylamide composite abrasive and chemical mechanical polishing behavior. Thin Solid Films 516, 3005 (2008). https://doi.org/10.1016/j.tsf.2007.11.050.10.1016/j.tsf.2007.11.050 ↗

26. R. Alfonsetti, L. Lozzi, M. Passacantando, P. Picozzi, and S. Santucci, XPS studies on SiOx thin films. Appl. Surf. Sci. 70–71, 222 (1993). https://doi.org/10.1016/0169-4332(93)90431-A.10.1016/0169-4332(93)90431-A ↗

27. Y. Mizokawa, K.M. Geib, and C.W. Wilmsen, Characterization of β-SiC surfaces and the Au/SiC interface. J. Vac. Sci. Technol. A 4, 1696 (1986). https://doi.org/10.1116/1.573958.10.1116/1.573958 ↗

28. M. Jain, J.R. Ramos-Serrano, A. Dutt, and Y. Matsumoto, The influence of deposition time on the photoluminescent properties of SiOxCy thin films obtained by Cat-CVD from monomethyl silane precursor. Mater. Lett. 291, 129547 (2021). https://doi.org/10.1016/j.matlet.2021.129547.10.1016/j.matlet.2021.129547 ↗

29. P. Zhao, E. Rusli, J.H. Xia, C.M. Tan, Y. Liu, C.C. Tin, S.F. Yoon, W. Zhu, and J. Ahn, Study of carbon in thermal oxide formed on 4H-SiC by XPS. Mater. Sci. For. 483–485, 653 (2005). https://doi.org/10.4028/www.scientific.net/MSF.483-485.653.10.4028/www.scientific.net/MSF.483-485.653 ↗

30. X. Yao, T. Kong, S. Yu, L. Li, F. Yang, and L. Dong, Influence of different supports on the physicochemical properties and denitration performance of the supported Mn-based catalysts for NH3-SCR at low temperature. Appl. Surf. Sci. 402, 208 (2017). https://doi.org/10.1016/j.apsusc.2017.01.081.10.1016/j.apsusc.2017.01.081 ↗

31. S. Cai, H. Hu, H. Li, L. Shi, and D. Zhang, Design of multi-shell Fe2O3@MnOx@CNTs for the selective catalytic reduction of NO with NH3: improvement of catalytic activity and SO2 tolerance. Nanoscale 8, 3588 (2016). https://doi.org/10.1039/C5NR08701E.10.1039/C5NR08701E ↗

32. R. Gao, D. Zhang, P. Maitarad, L. Shi, T. Rungrotmongkol, H. Li, J. Zhang, and W. Cao, Morphology-dependent properties of MnOx/ZrO2–CeO2 nanostructures for the selective catalytic reduction of NO with NH3. J. Phys. Chem. C 117, 10502 (2013). https://doi.org/10.1021/jp400984z.10.1021/jp400984z ↗

33. A.P. Grosvenor, E.M. Bellhouse, A. Korinek, M. Bugnet, and J.R. McDermid, XPS and EELS characterization of Mn2SiO4, MnSiO3 and MnAl2O4. Appl. Surf. Sci. 379, 242 (2016). https://doi.org/10.1016/j.apsusc.2016.03.235.10.1016/j.apsusc.2016.03.235 ↗

34. W.-J. Li, T.-Y. Li, and M.-Y. Wey, Preferred enhancement of fast-SCR by Mn/CeSiOx catalyst: study on Ce/Si promotion and shape dependence. Chem. Eng. J. 403, 126317 (2021). https://doi.org/10.1016/j.cej.2020.126317.10.1016/j.cej.2020.126317 ↗

35. L. Jiang, Q. Liu, G. Ran, M. Kong, S. Ren, J. Yang, and J. Li, V2O5-modified Mn-Ce/AC catalyst with high SO2 tolerance for low-temperature NH3-SCR of NO. Chem. Eng. J. 370, 810 (2019). https://doi.org/10.1016/j.cej.2019.03.225.10.1016/j.cej.2019.03.225 ↗

36. B. Shen, Y. Wang, F. Wang, and T. Liu, The effect of Ce-Zr on NH3-SCR activity over MnOx(0.6)/Ce0.5Zr0.5O2 at low temperature. Chem. Eng. J. 236, 171 (2014). https://doi.org/10.1016/j.cej.2013.09.085.10.1016/j.cej.2013.09.085 ↗

37. F.A. Kröger and H.J. Vink, In F. Seitz, D. Turnbull (eds)solid state physicsacademic Press, (1956), https://doi.org/10.1016/S0081-1947(08)60135-610.1016/S0081-1947(08)60135-6 ↗

38. X. Han, N. Amrane, Z. Zhang, and M. Benkraouda, Oxygen vacancy ordering and electron localization in CeO2: hybrid functional study. J. Phys. Chem. C 120, 13325 (2016). https://doi.org/10.1021/acs.jpcc.6b00865.10.1021/acs.jpcc.6b00865 ↗

39. Y. Wang, Y. Chen, F. Qi, D. Zhao, and W. Liu, A material removal model for silicon oxide layers in chemical mechanical planarization considering the promoted chemical reaction by the down pressure. Tribol. Int. 93, 11 (2016). https://doi.org/10.1016/j.triboint.2015.09.008.10.1016/j.triboint.2015.09.008 ↗

40. L. Xu, H. Lei, Z. Ding, Y. Chen, R. Ding, and T. Kim, Preparation of the rod-shaped SiO2@C abrasive and effects of its microstructure on the polishing of zirconia ceramics. Powder Technol. 395, 338 (2022). https://doi.org/10.1016/j.powtec.2021.09.070.10.1016/j.powtec.2021.09.070 ↗

41. X. Yuan, H. Lei, and C. Chen, An ethylenediaminetetraacetic acid (EDTA) surface-functionalized CeO2 composite abrasives with the effective improvement of the removal rate on glass CMP. Ceram. Int. 50, 293 (2024). https://doi.org/10.1016/j.ceramint.2023.10.103.10.1016/j.ceramint.2023.10.103 ↗

42. X. Yuan, C. Chen, H. Lei, and Z. Zhang, Synthesis, characterization of CeO2@ZIF-8 composite abrasives and their chemical mechanical polishing behavior on glass substrate. Ceram. Int. 49, 5189 (2023). https://doi.org/10.1016/j.ceramint.2022.10.037.10.1016/j.ceramint.2022.10.037 ↗