journal article·2025-12

Research on Explosive Welding of A1050/Q235B Using Q235B as an Interlayer

Haojie Guo, Guichun Zhu, Xiangyu Zeng, Linghe Meng, Guofeng Liang, Jianian Hu, Xiang Chen

JOM· Volume 77· Issue 12
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1. J. Schneider, and R. Radzilowski, JOM 66, 2123 https://doi.org/10.1007/s11837-014-1134-5 (2014).10.1007/s11837-014-1134-5 ↗
2. G. Carvalho, I. Galvão, R. Mendes, R.M. Leal, and A. Loureiro, Mater Charact 155, 109819 https://doi.org/10.1016/j.matchar.2019.109819 (2019).10.1016/j.matchar.2019.109819 ↗
3. Q.L. Chu, T. Xia, P.K. Zhao, M. Zhang, J.M. Zheng, F.X. Yan, P. Cheng, C. Yan, C. Liu, and H.L. Luo, Mater. Sci. Eng. A 833, 142525 https://doi.org/10.1016/j.msea.2021.142525 (2022).10.1016/j.msea.2021.142525 ↗
4. P. Li, S. Chen, H.G. Dong, H. Ji, Y.B. Li, X. Guo, G.S. Yang, X.S. Zhang, and X.L. Han, J. Manuf. Process. 49, 385 https://doi.org/10.1016/j.jmapro.2019.09.047 (2020).10.1016/j.jmapro.2019.09.047 ↗
5. H. Shan, Y.W. Ma, S.Z. Niu, B.X. Yang, M. Lou, Y.B. Li, and Z.Q. Lin, J. Mater. Process. Technol. 295, 117156 https://doi.org/10.1016/j.jmatprotec.2021.117156 (2021).10.1016/j.jmatprotec.2021.117156 ↗
6. Y.L. Li, Y.R. Liu, and J. Yang, Opt. Laser Technol. 122, 105875 https://doi.org/10.1016/j.optlastec.2019.105875 (2002).10.1016/j.optlastec.2019.105875 ↗
7. H.P. Yu, H.Q. Dang, and Y.N. Qiu, J. Mater. Process. Technol. 250, 297 https://doi.org/10.1016/j.jmatprotec.2017.07.027 (2017).10.1016/j.jmatprotec.2017.07.027 ↗
8. H.R. Akramifard, H. Mirzadeh, and M.H. Parsa, Mater. Sci. Eng. A 613, 232 https://doi.org/10.1016/j.msea.2014.06.109 (2014).10.1016/j.msea.2014.06.109 ↗
9. W.H. Zhang, D.Q. Sun, L.J. Han, and D.Y. Liu, Mater. Des. 57, 186 https://doi.org/10.1016/j.matdes.2013.12.045 (2014).10.1016/j.matdes.2013.12.045 ↗
10. T. Watanabe, H. Sakuyama, and A. Yanagisawa, J. Mater. Process. Technol. 209(15–16), 5475 https://doi.org/10.1016/j.jmatprotec.2009.05.006 (2009).10.1016/j.jmatprotec.2009.05.006 ↗
11. G.L. Qin, Z.Y. Ao, Y. Chen, C.S. Zhang, and P.H. Geng, J. Mater. Process. Technol. 273, 116255 https://doi.org/10.1016/j.jmatprotec.2019.116255 (2019).10.1016/j.jmatprotec.2019.116255 ↗
12. R. Mendes, J.B. Ribeiro, and A. Loureiro, Mater. Des. 51, 182 https://doi.org/10.1016/j.matdes.2013.03.069 (2013).10.1016/j.matdes.2013.03.069 ↗
13. X.Z. Guo, M.Y. Fan, L.A. Wang, and F.Y. Ma, J. Mater. Eng. Perform. 25, 2157 https://doi.org/10.1007/s11665-016-2057-9 (2016).10.1007/s11665-016-2057-9 ↗
14. J.W. Huang, G.F. Liang, J.N. Hu, X.J. Li, X. Chen, and X.Q. Xie, J. Mater. Res. Technol. 32, 3333 https://doi.org/10.1016/j.jmrt.2024.08.179 (2024).10.1016/j.jmrt.2024.08.179 ↗
15. T.C. Zha, C.H. Zhang, W.G. Zhu, X.M. He, X.K. Zeng, N.N. Li, and C.B. Song, Mater Charact 209, 113669 https://doi.org/10.1016/j.matchar.2024.113669 (2024).10.1016/j.matchar.2024.113669 ↗
16. X. Chen, X.Q. Xie, J.N. Hu, X.J. Li, N. Luo, J.W. Huang, and G.F. Liang, J. Mater. Res. Technol. 30, 5529 https://doi.org/10.1016/j.jmrt.2024.04.209 (2024).10.1016/j.jmrt.2024.04.209 ↗
17. X.M. Wu, C.G. Shi, Z.H. Fang, S.L. Lin, and Z.R. Sun, Mater. Des. 197, 109279 https://doi.org/10.1016/j.matdes.2020.109279 (2021).10.1016/j.matdes.2020.109279 ↗
18. J. Kim, J. Kim, I. Kim, S. Kang, and K. Chun, Appl. Sci. 9(19), 4188 https://doi.org/10.3390/app9194188 (2019).10.3390/app9194188 ↗
19. Q. Zhou, H.H. Lu, X.K. Lan, Y.S. Guo, K.Y. Liu, G.Y. Huang, B. Jia, and P.W. Chen, J. Mater. Res. Technol. 25, 6472 https://doi.org/10.1016/j.jmrt.2023.07.080 (2023).10.1016/j.jmrt.2023.07.080 ↗
20. A. Mousavi, and S. Al-Hassani, J. Mech. Phys. Solids 53(11), 2501 https://doi.org/10.1016/j.jmps.2005.06.001 (2005).10.1016/j.jmps.2005.06.001 ↗
21. H. Paul, R. Chulist, and I. Mania, Metals 10(7), 969 https://doi.org/10.3390/met10070969 (2020).10.3390/met10070969 ↗
22. M.X. X, L.J. Zhang, G.F. Zhang, J.X. Zhang, Z.Y. Bi, P.C. Li, Mater. Des. 87, 181 (2015). https://doi.org/10.1016/j.matdes.2015.08.02110.1016/j.matdes.2015.08.021 ↗
23. M.X. X, X.T. Shang, L.J. Zhang, Q.L. Bai, T.T. Xu, Metals, 8(3), 159 (2018). https://doi.org/10.3390/met803015910.3390/met8030159 ↗
24. H. Hou, H.Q. Zhang, and S.H. Jiao, Baosteel Tech. Res. 11(01), 40 https://doi.org/10.3969/j.issn.1674-3458.2017.01.006 (2017).10.3969/j.issn.1674-3458.2017.01.006 ↗
25. H. Hou, H.Q. Zhang, and A.W. Zhang, Baosteel Tech. Res. 11(02), 42 https://doi.org/10.3969/j.issn.1674-3458.2017.02.007 (2017).10.3969/j.issn.1674-3458.2017.02.007 ↗
26. S. Kou, JOM 55, 37 https://doi.org/10.1007/s11837-003-0137-4 (2003).10.1007/s11837-003-0137-4 ↗
27. B.B. Sherpa, M.H. Yu, D. Inao, S. Tanaka, and K. Hokamoto, Adv. Eng. Mater. 26(1), 2301389 https://doi.org/10.1002/adem.202301389 (2024).10.1002/adem.202301389 ↗
28. H. Zhang, K.X. Jiao, J.L. Zhang, and J.P. Liu, Mater. Sci. Eng. A 756, 430 https://doi.org/10.1016/j.msea.2019.04.064 (2019).10.1016/j.msea.2019.04.064 ↗
29. B.B. Sherpa, M. Kuroda, T. Ikeda, K. Kawamura, D. Inao, S. Tanaka, and K. Hokamoto, Int. J. Adv. Manuf. Technol. 128(3–4), 1403 https://doi.org/10.1007/s00170-023-12010-y (2023).10.1007/s00170-023-12010-y ↗
30. J.N. Zhou, N. Luo, H.L. Liang, and W.F. Sun, J. Manuf. Process. 124, 1180 https://doi.org/10.1016/j.jmapro.2024.07.014 (2024).10.1016/j.jmapro.2024.07.014 ↗
31. K. Hokamoto, T. Izuma, and M. Fujita, Metall. Mater. Trans. A 24(10), 2289 https://doi.org/10.1007/BF02648602 (1993).10.1007/BF02648602 ↗
32. G. Zhang, M.J. Chen, Y. Shi, J.K. Huang, and F.Q. Yang, RSC Adv. 7(60), 37797 https://doi.org/10.1039/C7RA06354G (2017).10.1039/C7RA06354G ↗
33. A.J. Schwartz, Electron backscatter diffraction in materials science (Springer, New York, 2009).10.1007/978-0-387-88136-2 ↗
34. M. Bugajska, L. Maj, A. Jarzebska, S. Terlicka, M. Faryna, Z. Szulc, and J. Wojewoda-Budka, J. Mater. Eng. Perform. 31(9), 7088 https://doi.org/10.1007/s11665-022-07027-5 (2022).10.1007/s11665-022-07027-5 ↗
35. W. Pantleon, Scr. Mater. 58(11), 994 https://doi.org/10.1016/j.scriptamat.2008.01.050 (2008).10.1016/j.scriptamat.2008.01.050 ↗
36. M.R. Jandaghi, H. Pouraliakbar, J. Moverare, V. Fallah, and G. Khalaj, J. Mater. Res. Technol. 33, 2645 https://doi.org/10.1016/j.jmrt.2024.10.003 (2024).10.1016/j.jmrt.2024.10.003 ↗
37. M. Yang, and J.X. Wang, J. Mater. Res. Technol. 30, 4654 https://doi.org/10.1016/j.jmrt.2024.04.153 (2024).10.1016/j.jmrt.2024.04.153 ↗
38. M. Yang, H.H. Ma, Z.W. Shen, Z.C. Huang, Q.C. Tian, and J. Tian, Mater. Des. 186, 108348 https://doi.org/10.1016/j.matdes.2019.108348 (2020).10.1016/j.matdes.2019.108348 ↗
39. X.L. Li, A. Scherf, M. Heilmaier, and F. Stein, J. Phase Equilib. Diffus. 37, 162 https://doi.org/10.1007/s11669-015-0446-7 (2016).10.1007/s11669-015-0446-7 ↗
40. L. Jiang, N. Luo, H.L. Liang, and Y. Zhao, Int. J. Adv. Manuf. Technol. 123(9), 3021 https://doi.org/10.1007/s00170-022-10371-4 (2022).10.1007/s00170-022-10371-4 ↗
41. M. Yang, J.F. Xu, D.G. Chen, H.H. Ma, Z.W. Shen, B.Y. Zhang, and J. Tian, Appl. Surf. Sci. 566, 150703 https://doi.org/10.1016/j.apsusc.2021.150703 (2021).10.1016/j.apsusc.2021.150703 ↗
42. A.P. Sutton, Monogr. Phys. Chem. Mater. 414 (1995).
43. G. Carvalho, I. Galvão, R. Mendes, R.M. Leal, and A. Loureiro, Mater Charact 142, 432 https://doi.org/10.1016/j.matchar.2018.06.005 (2018).10.1016/j.matchar.2018.06.005 ↗
44. I. Galvão, G. Carvalho, J. Pimenta, T. Abreu, C. Leitão, R.M. Leal, and R. Mendes, Weld. World 68(11), 2911 https://doi.org/10.1007/s40194-024-01830-5 (2024).10.1007/s40194-024-01830-5 ↗
45. J.W. Huang, G.F. Liang, N. Luo, X.J. Li, X. Chen, and J.N. Hu, J. Mater. Res. Technol. 27, 2508 https://doi.org/10.1016/j.jmrt.2023.10.096 (2023).10.1016/j.jmrt.2023.10.096 ↗
46. J. Liu, B.T. Wu, Z.R. Wang, C.W. Li, G.Y. Chen, and Y.G. Miao, Mater. Des. 225, 111520 https://doi.org/10.1016/j.matdes.2022.111520 (2023).10.1016/j.matdes.2022.111520 ↗
47. G.F. Liang, J.W. Huang, D.P. Zhou, J.N. Hu, K.B. Li, G.C. Zhu, Z.S. Liu, and X. Chen, J. Mater. Sci. 59(33), 15883 https://doi.org/10.1007/s10853-024-10122-8 (2024).10.1007/s10853-024-10122-8 ↗
48. V.I. Mali, A.A. Bataev, I.N. Maliutina, V.D. Kurguzov, I.A. Bataev, M.A. Esikov, and V.S. Lozhkin, Int. J. Adv. Manuf. Technol. 93, 4285 https://doi.org/10.1007/s00170-017-0887-8 (2017).10.1007/s00170-017-0887-8 ↗
49. X. Chen, D. Inao, S. Tanaka, A. Mori, X.J. Li, and K. Hokamoto, J. Manuf. Process. 58, 1318 https://doi.org/10.1016/j.jmapro.2020.09.037 (2020).10.1016/j.jmapro.2020.09.037 ↗
50. H. Zhao, and L.Y. Sheng, J. Manuf. Process. 64, 265 https://doi.org/10.1016/j.jmapro.2021.01.026 (2021).10.1016/j.jmapro.2021.01.026 ↗