Plasma chemical vapour deposition of aluminium oxide on hardmetals
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References (20)
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1. Deutsche Patenschrift 2233700 vom 5, Juli 1972.
2. Factors affecting the initial nucleation of alumina on cemented carbide substrates in the CVD process10.1116/1.568687 ↗
3. Nucleation of Al2O3 layers on cemented carbide tools10.1149/1.2132876 ↗
4. Funk, R., Schachner, H., Triquet, C., Kornmann, M. & Lux, B., Coating of cemented carbide cutting tools with alumina by chemical vapor deposition. J. Electrochem. Soc., 123 (976) 285-9.10.1149/1.2132804 ↗
5. Zur Wirkungsweise von verschleiβhemmenden Al2O3-Shichten auf Hartmetall Schneidwerkzeugen
6. Thermodynamic and experimental analysis of alumina from Al2Cl3-H2-CO2 gas phase mixtures
7. Non equilibrium conditions for the CVD of alumina
8. Influence of the trace impurities on the transformation of alpha-Al2O3 layers by CVD
9. Microstructure of CVD-Al2O3
10. Phase transformation during CVD of aluminium oxide
11. Observations concerning the adherence of amorphous CVD alumina coatings on copper and copper alloys
12. Untersuchung von kathodenzerstäubten binären und ternären Hartstoffschichten zur Verschleiβ-minderung von Hartmetallein
13. Fabrication of aluminium oxide films with high deposition rates using the activated reactive evaporation technique10.1016/0257-8972(90)90075-N ↗
14. Ion-beam-assisted deposition of Al2O3 thin films10.1016/0257-8972(91)90158-S ↗
15. Properties of magnetron-sputtered electrically insulating Al2O3 coatings on copper10.1007/BF01105264 ↗
16. Niedrigtemperaturbeschichtungen für Hartmetalle
17. Research, development and performance of cemented carbide cutting tools coated by plasma-activated chemical vapour deposition10.1016/0257-8972(91)90193-Z ↗
18. Plasma assisted chemical vapor deposition
19. Plasmachemische Abscheidung und Charakterisierung von Hartstoffschichten aus Aluminiomoxid und Titannitride
20. Int. J. Refractory Metals & Hard Metals · 1990