Oxidation behavior and interfacial microstructure evolution of MoSi2/MoB coatings on Mo1 substrate at 600 and 1400 °C
Source abstract
Abstract
Boron was incorporated into the MoSi 2 coating via B Si co-cementation and a two-step process, i.e., boronizing followed by siliconizing. Compositional and microstructural changes arising from B-doping remarkably improved the performance of the MoSi 2 coating. At 600 °C, compositional change caused by B-doping led to the formation of borosilicate scale with lower viscosity relative to vitreous SiO 2 , which considerably enhanced the oxidation resistance. However, the pores that formed within the middle and lower part of the B-doping MoSi 2 coatings during preparation had a negative effect on the development of a continuous borosilicate scale. At 1400 °C, the interfacial reaction between MoB and Mo 5Si 3 led to the formation of a continuous Mo 5SiB 2 interlayer, which delayed the inward diffusion of Si within the coating. Accordingly, the growth rate of Mo 5Si 3 was roughly halved.
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