Erratum: “Energy distribution of positively and negatively charged plasma ions of a pulsed magnetron sputtering discharge in an argon/oxygen gas mixture and deposition of functional ZnO films” [J. Vac. Sci. Technol. A 43, 053002 (2025)]
Source abstract
Abstract
Energy distribution of positively and negatively charged plasma ions of a pulsed magnetron sputtering discharge
Only a short abstract or summary was supplied by the source.
Source: openalex_inverted_index · Quality: short
Research context
OpenAlex topics: Metal and Thin Film Mechanics · Semiconductor materials and devices
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Affiliations
Institute of Physics, Czech Academy of Sciences 1 , Na Slovance 2, Prague 18221,
Institut für Physik, Universität Greifswald 2 , Felix-Hausdorff-Str. 6, Greifswald 17489,
Laboratoire de Physique des Gaz et Plasmas—LPGP, UMR 8578, Université Paris-Saclay, CNRS 3 , Orsay Cedex 91405,
References
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