An x-ray photoelectron spectroscopy study of water removal from beryllium at 160 K: Evidence for ion beam induced oxidation

We present data for the ion beam removal of H2O from beryllium at 160 K. The removal rate of H2O from beryllium is qualitatively slower than that from copper. Evidence from x-ray photoelectron spectroscopic measurements indicates the ion beam causes surface oxidation up to a point where the oxide thickness prohibits further reaction. The mechanism for this ion beam induced surface oxidation is discussed and points toward H2O bond breakage by the ion beam as a significant contributing factor.