article·1972-01-01

Electron Microscope Study of the Nucleation and Growth of Electroless Cobalt and Nickel

S. L. CHOW, N. E. Hedgecock, M. Schlesinger, J. Rezek

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Abstract

High‐resolution electron micrographs and diffraction patterns of thin discontinuous cobalt and nickel films deposited electrolessly under various conditions are presented. It is concluded that nickel, when deposited from strongly alkaline solutions assumes a fcc structure. Evidence is presented that the structure of cobalt deposits can be either fcc or hcp depending on the chemistry of the metalizing solution. Mixed cobalt‐nickel films appear to form a fcc structure like nickel.
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Research context

OpenAlex topics: Electrodeposition and Electroless Coatings · Corrosion Behavior and Inhibition · Nanoporous metals and alloys

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