journal article·1997-09-01

Dependence on Morphology of Oxygen Precipitates upon Oxygen Supersaturation in Czochralski Silicon Crystals

Hiroyuki Fujimori

Publisher page

Abstract

The morphology of thermally induced oxygen precipitates in Czochralski silicon crystals and its dependence upon oxygen supersaturation were investigated using transmission electron microscopy. The morphology of oxygen precipitates depends not only upon the annealing temperature but also on oxygen supersaturation. On the other hand, the oxygen precipitates near the denuded zone are octahedral, independent of the annealing temperature used which demonstrates the important role oxygen concentration plays in morphology.
Source: openalex_inverted_index · Quality: baseline

Research context

OpenAlex topics: Silicon and Solar Cell Technologies · Solidification and crystal growth phenomena · Silicon Nanostructures and Photoluminescence

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Toshiba Ceramics Company Limited, Research and Development Center, 30 Soya, Hadano, Kanagawa 257, Japan

References

Reference metadata was not supplied for this record.