journal article·1985-05-01Open access

The Mechanism of Aluminum Electrodeposition from Solutions of AlCl3 and LiAlH4 in THF

M. W. M. Graef

Abstract

Aluminum coatings on metallic substrates can be made by electrodeposition from a nonaqueous solution such as and dissolved in tetrahydrofuran. Raman spectroscopy has been used to identify the chemical constituents of the plating bath. A quantitative analysis of the equilibrium composition is given. The electrode reactions have been studied by means of chronoamperometry. The catalytic behavior of hydride and the role of neutral and ionic aluminum containing species in the faradaic and chemical processes are elucidated. The influence of variations in the composition of the solution on the properties of the plating bath is explained in terms of the mechanism of the electrodeposition process.
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Research context

OpenAlex topics: Thermodynamic and Structural Properties of Metals and Alloys · Molten salt chemistry and electrochemical processes

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Affiliations

Philips Research Laboratories, 5600 JA Eindhoven, The Netherlands

References

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