Study of Ruthenium Oxides Species on Ruthenium Chemical Mechanical Planarization Using Periodate-Based Slurry
Source abstract
Abstract
Ruthenium (Ru) chemical mechanical planarization (CMP) with a slurry using sodium periodate (NaIO 4 ) as an oxidizer was carried out as a function of pH. The Ru polishing rate was highest at pH 7 and decreased as the pH decreased or increased. In addition, a similar trend in the corrosion current density as a function of pH was found. Two equivalent circuit models were proposed to explain the electrochemical impedance spectroscopy (EIS) results of Ru in NaIO 4 solution as a function of pH. From results of EIS, we found that the Ru film had a lowest charge transfer resistance in a neutral region than that in an acidic or alkaline region. This different charge transfer resistance of the Ru film as a function of pH resulted from the different surface composition of Ru oxide species, which was analyzed with X-ray photoelectron spectroscopy. Finally, we briefly derived a series of reaction equations between Ru and NaIO 4 on the basis of the above results and discussion.
Source: openalex_inverted_index · Quality: baseline
Research context
OpenAlex topics: Advanced Surface Polishing Techniques · Semiconductor materials and devices · Electrodeposition and Electroless Coatings
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
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