One-Step Electrodeposition of Cu[sub 2−x]Se and CuInSe[sub 2] Thin Films by the Induced Co-deposition Mechanism

The induced co‐deposition mechanism in one‐step electrodeposition of and thin films was investigated. and thin films were deposited potentiostatically on Mo substrates by a one‐step process from an acidic electrolyte containing ions as complexing agents. The films were examined by scanning electron microscopy, energy dispersive X‐ray spectrometry, X‐ray diffraction, and ion beam analysis methods. Good control of stoichiometry was achieved over a wide potential range, thus indicating that the film composition may indeed be controlled by the induced co‐deposition mechanism. The effects of the thiocyanate ions on the reduction potentials of , , and ions were examined by cyclic voltammetry. In order to improve their crystallinity, the films were annealed under a atmosphere after deposition. © 2000 The Electrochemical Society. All rights reserved.