article·2007-11-27Open access

Galvanic Coupling Between Pure Copper and Pure Aluminum

Jean-Baptiste Jorcin, Christine Blanc, Nadine Pébère, Bernard Tribollet, Vincent Vivier

Abstract

The corrosion behavior of a pure aluminum/pure copper couple in a weakly conductive sulfate solution was investigated. Potential and current distributions on the surface of the model couple at the beginning of immersion were obtained by solving the Laplace equation using a finite element method (FEM) algorithm. The potential distribution predicted by the calculations was checked using a microreference electrode. A good agreement was found between experimental and theoretical results. It was shown that the reaction occurring at the copper electrode was oxygen reduction, while aluminum remote from the interface remained in the passive state. Moreover, calculations predicted a large cathodic current, related to an increase in oxygen reduction, restricted to copper at the interface. This led to a local pH increase reaching values higher than 9, allowing the dissolution of aluminum to occur close to the interface. Combining these data with optical and scanning electron microscope observations after of immersion in the sodium sulfate solution allowed a three-step mechanism to be proposed to explain the corrosion damage, and particularly the presence of a copper deposit on the aluminum surface, some distance from the interface, a phenomenon currently observed in commercial copper-rich aluminum alloys.
Source: openalex_inverted_index · Quality: baseline

Research context

OpenAlex topics: Corrosion Behavior and Inhibition · Aluminum Alloy Microstructure Properties · Anodic Oxide Films and Nanostructures

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