journal article·1976-07-01

Formation of Silicon Nitride at a Si ‐ SiO2 Interface during Local Oxidation of Silicon and during Heat‐Treatment of Oxidized Silicon in NH 3 Gas

E. Kooi, J. G. van Lierop, J. A. Appels

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Abstract

Abstract not Available.
Only a short abstract or summary was supplied by the source.
Source: openalex_inverted_index · Quality: short

Research context

OpenAlex topics: Silicon Nanostructures and Photoluminescence · Semiconductor materials and devices · Silicon and Solar Cell Technologies

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Affiliations

Philips Research Laboratories, Eindhoven, The Netherlands

References

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