Contribution to the Theory of Electropolishing
Source abstract
Abstract
An ideal electropolishing process is characterized by a plateau of the current density‐potential curve corresponding to the maximum diffusion rate of an acceptor for metal ions toward the anode. Such a process is amenable to a quantitative theoretical analysis. Formulas are derived for decrease of surface roughness as a function of the recess of the average surface, amount of metal dissolved per unit surface area, and product of current density and time.
Source: openalex_inverted_index · Quality: baseline
Research context
OpenAlex topics: Molecular Junctions and Nanostructures · Electrodeposition and Electroless Coatings · Copper Interconnects and Reliability
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
References
Reference metadata was not supplied for this record.