Development of Positive Photoresists
Source abstract
Abstract
A mechanism for the development of positive optical photoresists is proposed, leading to the derivation of a development rate equation. This rate equation compares favorably with experimentally determined development rates. Typical values of the rate constants involved are given. Empirical models are given for the surface induction and substrate adhesion effects.
Source: openalex_inverted_index · Quality: baseline
Research context
OpenAlex topics: Semiconductor materials and devices · Advancements in Photolithography Techniques · Surface Roughness and Optical Measurements
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Affiliations
Department of Defense, Fort Meade, Maryland 20755‐6000
References
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