A Point Defect Model for Anodic Passive Films: II . Chemical Breakdown and Pit Initiation
Source abstract
Abstract
The point defect model that was previously developed (1) to explain the growth kinetics of a passive film has been extended to account for chemical breakdown. This model provides quantitative explanations of the dependence of breakdown potential on halide concentration, and of the incubation time‐breakdown overpotential relationships that have been observed for iron and nickel in aqueous solutions. Limitations of the model are identified and discussed.
Source: openalex_inverted_index · Quality: baseline
Research context
OpenAlex topics: Corrosion Behavior and Inhibition · Anodic Oxide Films and Nanostructures · Concrete Corrosion and Durability
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Affiliations
Department of Metallurgical Engineering, The Ohio State University, Columbus, Ohio 43210
References
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